H01J 37/143
Permanent magnetic lenses
H01J37/143 (Permanent magnetic lenses) appears on 33 US grants and 41 published applications in this corpus.
Search patents in H01J- Granted patents
- 33
- Published applications
- 41
- Assignees
- 21
- Inventors
- 89
- Latest grant
- 11 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2004 | 0 | 1 |
| 2005 | 1 | 1 |
| 2006 | 1 | 2 |
| 2007 | 1 | 1 |
| 2008 | 1 | 1 |
| 2009 | 1 | 1 |
| 2010 | 1 | 2 |
| 2011 | 0 | 1 |
| 2012 | 1 | 1 |
| 2013 | 1 | 1 |
| 2014 | 2 | 2 |
| 2015 | 2 | 1 |
| 2016 | 1 | 2 |
| 2017 | 4 | 4 |
| 2018 | 1 | 1 |
| 2019 | 3 | 2 |
| 2020 | 0 | 3 |
| 2021 | 2 | 0 |
| 2022 | 1 | 2 |
| 2023 | 2 | 6 |
| 2024 | 1 | 4 |
| 2025 | 1 | 1 |
| 2026 | 5 | 1 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- Adjustable permanent magnetic lens having thermal control device11 Aug 2026US 12,706,270 B2IMS Nanofabrication GmbH
- Electron microscope7 Jul 2026US 12,676,279 B2Hitachi High-Tech Corporation
- Adjustable permanent magnetic lens having shunting device30 Jun 2026US 12,671,054 B2IMS Nanofabrication GmbH
- Charged particle source28 Apr 2026US 12,614,691 B2ASML Netherlands B. V.
- Multiple particle beam system with a contrast correction lens system14 Apr 2026US 12,603,245 B2Carl Zeiss MultiSEM GmbH
- Charged particle lens12 Feb 2026US 2026/0045441 A1FEI Company
- High-voltage column with permanent magnet lens and positive wafer bias for overlay18 Dec 2025US 2025/0385066 A1
- Electron Microscope18 Jul 2024US 2024/0242923 A1Hitachi High-Tech Corporation
- Charged particle optical system and charged particle apparatus27 Jun 2024US 2024/0212969 A1Nikon Corporation
- Adjustable Magnetic Lens Having Permanent-Magnetic and Electromagnetic Components27 Jun 2024US 2024/0212970 A1IMS Nanofabrication GmbH
Most cited
By later US patents
- Multi-column electron beam exposure apparatus and magnetic field generation device14US 8,390,201 B2Advantest Corporation · 2013
- Permanent magnet lens array14US 8,698,094 B1KLA-Tencor Corporation · 2014
- Permanent magnet based high performance multi-axis immersion electron lens array with low axial leakage field10US 9,165,745 B2Maglen Pte Ltd · 2015
- Apparatus with permanent magnetic lenses9US 7,064,325 B2FEI Company · 2006
- Electron beam source having an extraction electrode provided with a magnetic disk element7US 7,372,195 B2APPLIED Materials.Inc. · 2008