Param Corporation
Tokyo, JP· latest recorded location
PARAM CORPORATION is named on 4 US grants and 5 published applications in this corpus. Its most frequent classification is H01J (Electric discharge tubes or discharge lamps).
- Granted patents
- 4
- Published applications
- 5
- Inventors
- 7
- Granted in 2026 so far
- 0
- Most recent grant
- 5 Apr 2022
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2013 | 0 | 1 |
| 2014 | 1 | 3 |
| 2015 | 1 | 0 |
| 2016 | 1 | 0 |
| 2017 | 0 | 0 |
| 2018 | 0 | 0 |
| 2019 | 0 | 0 |
| 2020 | 0 | 0 |
| 2021 | 0 | 0 |
| 2022 | 1 | 1 |
By publication year.
Technology areas
Share of 9 documents
Recent patents
- Electron gun device5 Apr 2022US 11,295,925 B2
- Tubular permanent magnet used in a multi-electron beam device16 Aug 2016US 9,418,815 B2
- Electron gun and electron beam device30 Jun 2015US 9,070,527 B2
- Electron beam lithography device and lithographic method4 Nov 2014US 8,878,143 B2
- Electron gun device17 Feb 2022US 2022/0051866 A1
- Electron lens and the electron beam device11 Sep 2014US 2014/0252245 A1
- Electron beam lithography device and lithographic method21 Aug 2014US 2014/0231668 A1
- Electron gun and electron beam device27 Feb 2014US 2014/0055025 A1
- Electron lens and the electron beam device30 May 2013US 2013/0134322 A1
Most cited
By later US patents