H01J 2237/336
Changing physical properties of treated surfaces
H01J2237/336 (Changing physical properties of treated surfaces) appears on 117 US grants and 149 published applications in this corpus.
Search patents in H01J- Granted patents
- 117
- Published applications
- 149
- Assignees
- 76
- Inventors
- 449
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 2 | 0 |
| 1994 | 2 | 0 |
| 1995 | 4 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 2 | 0 |
| 2000 | 2 | 0 |
| 2001 | 4 | 2 |
| 2002 | 6 | 8 |
| 2003 | 4 | 1 |
| 2004 | 2 | 8 |
| 2005 | 3 | 2 |
| 2006 | 1 | 2 |
| 2007 | 4 | 1 |
| 2008 | 0 | 2 |
| 2009 | 2 | 1 |
| 2010 | 1 | 2 |
| 2011 | 0 | 0 |
| 2012 | 0 | 5 |
| 2013 | 2 | 1 |
| 2014 | 3 | 5 |
| 2015 | 5 | 11 |
| 2016 | 7 | 15 |
| 2017 | 9 | 9 |
| 2018 | 8 | 9 |
| 2019 | 7 | 3 |
| 2020 | 2 | 7 |
| 2021 | 2 | 3 |
| 2022 | 5 | 2 |
| 2023 | 2 | 7 |
| 2024 | 1 | 19 |
| 2025 | 8 | 9 |
| 2026 | 14 | 15 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Enhanced dry desmear equipment with protective film peeling capability for integrated circuits29 Sep 2026US 12,749,660 B2Intel Corporation
- Substrate processing method and plasma processing apparatus8 Sep 2026US 12,731,764 B2Tokyo Electron Limited
- Higher pressure purge for impurity reduction in radical treatment chamber8 Sep 2026US 12,731,769 B2APPLIED Materials.Inc.
- Scrubber, substrate processing system including the same, and substrate processing method using the same8 Sep 2026US 12,731,770 B2Korea Institute of Machinery & Materials
- RF blocker for uniformity control18 Aug 2026US 12,712,160 B2APPLIED Materials.Inc.
- Higher pressure purge for impurity reduction in radical treatment chamber1 Oct 2026US 2026/0302143 A1APPLIED Materials.Inc.
- Plasma probe24 Sep 2026US 2026/0290759 A1Erbe Elektromedizin GmbH
- Rf blocker for uniformity control17 Sep 2026US 2026/0279740 A1APPLIED Materials.Inc.
- Apparatus for manufacturing semiconductor structures and method for manufacturing semiconductor structures10 Sep 2026US 2026/0269189 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Methods for Reshaping Masking Layer Openings10 Sep 2026US 2026/0271678 A1APPLIED Materials.Inc.
Most cited
By later US patents
- One atmosphere, uniform glow discharge plasma139US 5,414,324 AThe University of Tennessee Research Corporation · 1995
- Plasma activated conformal dielectric film deposition97US 8,637,411 B2Novellus Systems, Inc. · 2014
- Method and apparatus for glow discharge plasma treatment of polymer materials at atmospheric pressure95US 5,456,972 AThe University of Tennessee Research Corporation · 1995
- Method and apparatus for glow discharge plasma treatment of polymer materials at atmospheric pressure89US 5,403,453 AThe University of Tennessee Research Corporation · 1995
- Remote exposure of workpieces using a recirculated plasma66US 6,406,759 B1The University of Tennessee Research Corporation · 2002