H01J 2237/3348
Control of ion bombardment energy
Official title: control of ion bombardment energy
H01J2237/3348 (Control of ion bombardment energy) appears on 43 US grants and 36 published applications in this corpus.
Search patents in H01J- Granted patents
- 43
- Published applications
- 36
- Assignees
- 25
- Inventors
- 130
- Latest grant
- 8 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 2 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 2 | 0 |
| 1993 | 2 | 0 |
| 1994 | 1 | 0 |
| 1995 | 3 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 1 | 0 |
| 2001 | 1 | 0 |
| 2002 | 0 | 0 |
| 2003 | 1 | 1 |
| 2004 | 0 | 1 |
| 2005 | 1 | 1 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 1 | 0 |
| 2010 | 0 | 1 |
| 2011 | 0 | 0 |
| 2012 | 1 | 3 |
| 2013 | 0 | 3 |
| 2014 | 3 | 3 |
| 2015 | 3 | 5 |
| 2016 | 3 | 2 |
| 2017 | 2 | 1 |
| 2018 | 1 | 1 |
| 2019 | 2 | 1 |
| 2020 | 2 | 0 |
| 2021 | 1 | 0 |
| 2022 | 0 | 2 |
| 2023 | 0 | 2 |
| 2024 | 2 | 3 |
| 2025 | 1 | 5 |
| 2026 | 2 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Plasma processing system, assistance device, assistance method, and assistance program8 Sep 2026US 12,731,763 B2Tokyo Electron Limited
- Multi-state RF pulsing in cycling recipes to reduce charging induced defects4 Aug 2026US 12,700,567 B2Lam Research Corporation
- Plasma processing method and plasma processing apparatus8 Jul 2025US 12,354,837 B2Tokyo Electron Limited
- Systems and methods for extracting process control information from radiofrequency supply system of plasma processing system29 Oct 2024US 12,131,886 B2Lam Research Corporation
- Semiconductor processing chamber3 Sep 2024US 12,080,524 B2Beijing Naura Microelectronics Equipment Co., Ltd.
- Etching apparatus and etching method15 Jan 2026US 2026/0018381 A1Tokyo Electron Limited
- Grid-less ion angle detector18 Sep 2025US 2025/0291076 A1Tokyo Electron Limited
- Grid-less ion energy detector18 Sep 2025US 2025/0292994 A1Tokyo Electron Limited
- Selective etching in semiconductor devices31 Jul 2025US 2025/0246437 A1Tokyo Electron Limited
- Plasma processing system, assistance device, assistance method, and assistance program8 May 2025US 2025/0149299 A1Tokyo Electron Limited
Most cited
By later US patents
- Plasma treating method and apparatus therefor117US 4,795,529 AHitachi, Ltd. · 1989
- Method and apparatus for plasma process95US 4,563,240 AHitachi, Ltd. · 1986
- Dry etching method82US 4,233,109 AZaidan Hojin Handotai Kenkyu Shinkokai · 1980
- Apparatus for coating or etching by means of a plasma74US 4,863,549 ALeybold Aktiengesellschaft · 1989
- Plasma generating apparatus72US 5,147,493 ATokyo Electron Limited · 1992