Semiconductor processing chamber

A semiconductor processing chamber, comprising:

• a chamber having an opening at a top of the chamber;
• a housing disposed above the opening;
• a dielectric window disposed inside the housing and above the opening;
• a coil arranged circumferentially at an inner top wall of the housing;
• a hot air hood disposed inside the housing and fixedly attached to the dielectric window, wherein the hot air hood and the inner top wall of the housing are separated by a clearance gap, and the hot air hood includes a heating compartment for heating the dielectric window and at least two air passage ports connected to the heating compartment;
• and
• an air distribution structure being fixedly attached to the housing and including a plurality of air passages, at least two air exchange ports located outside the housing for air intake and air discharge, and at least two transfer ports located inside the housing and respectively connected to the at least two air exchange ports, wherein equal numbers of exchange ports and transfer ports are connected to each other in a one-to-one correspondence.