H01J 2237/3325
Large area
Official title: large area
H01J2237/3325 (Large area) appears on 33 US grants and 26 published applications in this corpus.
Search patents in H01J- Granted patents
- 33
- Published applications
- 26
- Assignees
- 32
- Inventors
- 117
- Latest grant
- 20 Jan 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1984 | 2 | 0 |
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 2 | 0 |
| 1993 | 0 | 0 |
| 1994 | 2 | 0 |
| 1995 | 1 | 0 |
| 1996 | 2 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 1 | 0 |
| 2001 | 2 | 1 |
| 2002 | 1 | 1 |
| 2003 | 1 | 1 |
| 2004 | 1 | 0 |
| 2005 | 0 | 3 |
| 2006 | 0 | 3 |
| 2007 | 0 | 2 |
| 2008 | 1 | 2 |
| 2009 | 1 | 0 |
| 2010 | 0 | 1 |
| 2011 | 1 | 1 |
| 2012 | 1 | 0 |
| 2013 | 1 | 0 |
| 2014 | 1 | 1 |
| 2015 | 1 | 1 |
| 2016 | 0 | 1 |
| 2017 | 1 | 0 |
| 2018 | 0 | 3 |
| 2019 | 2 | 1 |
| 2020 | 2 | 2 |
| 2021 | 0 | 0 |
| 2022 | 1 | 0 |
| 2023 | 0 | 2 |
| 2024 | 0 | 0 |
| 2025 | 1 | 0 |
| 2026 | 1 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Automated feedforward and feedback sequence for patterning CD control20 Jan 2026US 12,531,220 B2Lam Research Corporation
- Large-area high-density plasma processing chamber for flat panel displays27 May 2025US 12,312,689 B2APPLIED Materials.Inc.
- Plasma treatment device and structure of reaction vessel for plasma treatment18 Jan 2022US 11,225,718 B2Askagi Corporation
- Hollow cathode plasma source10 Mar 2020US 10,586,685 B2Agc Flat Glass North America, Inc.
- Hollow cathode plasma source14 Jan 2020US 10,535,503 B2Agc Flat Glass North America, Inc.
- Large-area high-density plasma processing chamber for flat panel displays31 Aug 2023US 2023/0272530 A1APPLIED Materials.Inc.
- Automated feedforward and feedback sequence for patterning cd control1 Jun 2023US 2023/0170195 A1Lam Research Corporation
- Large-area high-density plasma processing chamber for flat panel displays5 Nov 2020US 2020/0347499 A1APPLIED Materials.Inc.
- Heat conductive spacer for plasma processing chamber26 Mar 2020US 2020/0098549 A1
- Plasma treatment device and structure of reaction vessel for plasma treatment14 Feb 2019US 2019/0048468 A1Askagi Corporation
Most cited
By later US patents
- Plasma uniformity control by gas diffuser hole design746US 8,083,853 B2APPLIED Materials.Inc. · 2011
- Surface-treated shower head for use in a substrate processing chamber584US 6,182,603 B2Applied Komatsu Technology, Inc. · 2001
- Plasma system comprising hollow mesh plate electrode172US 5,304,250 ASony Corporation · 1994
- Method and apparatus for in-situ film stack processing172US 7,358,192 B2APPLIED Materials.Inc. · 2008
- Apparatus for microwave glow discharge deposition88US 4,566,403 ASovonics Solar Systems · 1986