Hollow cathode plasma source
AssigneesAgc Glass Europe, Agc Flat Glass North America, Inc., Asahi Glass Company, Limited
InventorsThomas Biquet, Peter Maschwitz, John Chambers, Hughes Wiame
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Abstract
The present invention relates to a hollow cathode plasma source and to methods for surface treating or coating using such a plasma source, comprising first and second electrodes (1, 2), each electrode comprising an elongated cavity (4), wherein dimensions for at least one of the following parameters is selected so as to ensure high electron density and/or low amount of sputtering of plasma source cavity surfaces, those parameters being cavity cross section shape, cavity cross section area cavity distance (11), and outlet nozzle width (12).
Claims7
A hollow cathode plasma source comprising a first electrode and a second electrode each electrode comprising an elongated cavity,
- wherein the electrodes extend substantially parallel to each other,
- wherein the first and second electrodes are both provided with a gas inlet for a plasma forming gas and with a gas outlet which leads to an outlet nozzle which is directed towards a substrate,
- wherein first and second electrodes are electrically connected to a power source supplying the electrodes with alternatingly opposing voltages, and
- wherein the following parameter's dimension are selected
- i. the cavity cross section is of rectangular, rounded rectangular or circular shape or of a shape intermediary of these shapes,
- ii. the cavity cross section area is comprised between 500 mm2 and 4000 mm2,
- iii. the cavity distance is comprised between 85 mm and 160 mm, and
- iv. the outlet nozzle width is comprised between 1 mm and 25 mm.
Dependencies are inferred from the claim text.