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OwnerBeom Soo PARK, Robin L. TINER +11inventors
InventorsBeom Soo PARK, Robin L. TINER, Jianheng LI, Sang Jeong OH, Lai ZHAO, Gaku FURUTA, Soo Young CHOI, Jeevan Prakash SEQUEIRA, Wei-Ting CHEN, Hsiao-Ling YANG, Cheng-Hang HSU, Won Ho SUNG, Hyun Young HONG
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A plasma processing chamber includes a chamber body and a lid assembly coupled to the chamber body to define a processing volume. The lid assembly includes a backing plate coupled to the chamber body, a diffuser with a plurality of openings formed therethrough, and a heat conductive spacer disposed between and coupled to the backing plate and the diffuser to transfer heat from the diffuser to the backing plate. The plasma processing chamber further includes a substrate support disposed within the processing volume.
A plasma processing chamber, comprising:
A lid assembly for a plasma processing chamber, comprising:
A lid assembly for a plasma processing chamber, comprising:
Dependencies are inferred from the claim text.