H01J 2237/2812
Emission microscopes
H01J2237/2812 (Emission microscopes) appears on 34 US grants and 40 published applications in this corpus.
Search patents in H01J- Granted patents
- 34
- Published applications
- 40
- Assignees
- 17
- Inventors
- 81
- Latest grant
- 8 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2005 | 0 | 1 |
| 2006 | 0 | 0 |
| 2007 | 0 | 15 |
| 2008 | 1 | 1 |
| 2009 | 14 | 1 |
| 2010 | 2 | 2 |
| 2011 | 1 | 0 |
| 2012 | 1 | 2 |
| 2013 | 1 | 1 |
| 2014 | 2 | 3 |
| 2015 | 3 | 4 |
| 2016 | 3 | 1 |
| 2017 | 0 | 0 |
| 2018 | 1 | 0 |
| 2019 | 0 | 0 |
| 2020 | 0 | 0 |
| 2021 | 0 | 2 |
| 2022 | 1 | 0 |
| 2023 | 1 | 1 |
| 2024 | 0 | 2 |
| 2025 | 1 | 2 |
| 2026 | 2 | 2 |
By publication year. 2026 runs to 8 Oct.
Recent patents
- Spin-polarized scanning electron microscope8 Sep 2026US 12,731,760 B2Hitachi High-Tech Corporation
- Luminescence method for the in-line detection of atomic scale defects during fabrication of 4H—SiC diodes16 Jun 2026US 12,660,570 B2The University of Hong Kong
- Electron gun and electron microscope24 Jun 2025US 12,340,969 B2KLA Corporation
- Correlation between emission spots utilizing CAD data in combination with emission microscope images24 Jan 2023US 11,561,256 B2Synopsys, Inc.
- Energy beam input to atom probe specimens from multiple angles24 May 2022US 11,340,256 B2Cameca Instruments, Inc.
- Device, Control Method for Same, and Program20 Aug 2026US 2026/0245829 A1Hitachi High-Tech Corporation
- Substrate inspection apparatus and substrate inspection system23 Jul 2026US 2026/0213122 A1Samsung Electronics Co., Ltd.
- Charged particle apparatus18 Dec 2025US 2025/0385072 A1ASML Netherlands B. V.
- Wafer edge inspection of charged particle inspection system17 Jul 2025US 2025/0232941 A1ASML Netherlands B. V.
- Spin-polarized scanning electron microscope25 Jul 2024US 2024/0249911 A1Hitachi High-Tech Corporation
Most cited
By later US patents
- Ion sources, systems and methods93US 7,554,096 B2ALIS Corporation · 2009
- Ion sources, systems and methods67US 7,554,097 B2ALIS Corporation · 2009
- Ion sources, systems and methods65US 7,557,359 B2ALIS Corporation · 2009
- Ion sources, systems and methods64US 7,557,358 B2ALIS Corporation · 2009
- Ion sources, systems and methods63US 7,557,360 B2ALIS Corporation · 2009