H01J 2237/1215
Annular electrodes
H01J2237/1215 (Annular electrodes) appears on 25 US grants and 29 published applications in this corpus.
Search patents in H01J- Granted patents
- 25
- Published applications
- 29
- Assignees
- 16
- Inventors
- 49
- Latest grant
- 19 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1992 | 2 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 1 |
| 2005 | 1 | 1 |
| 2006 | 0 | 0 |
| 2007 | 1 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 1 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 1 | 3 |
| 2016 | 1 | 2 |
| 2017 | 0 | 2 |
| 2018 | 1 | 0 |
| 2019 | 0 | 0 |
| 2020 | 2 | 4 |
| 2021 | 1 | 2 |
| 2022 | 2 | 4 |
| 2023 | 3 | 2 |
| 2024 | 4 | 4 |
| 2025 | 1 | 3 |
| 2026 | 3 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Electron beam apparatus, foil or grid lens, and method of operating an electron beam apparatus19 May 2026US 12,633,489 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Beam manipulator in charged particle-beam exposure apparatus5 May 2026US 12,620,547 B2ASML Netherlands B. V.
- Axially progressive lens for transporting charged particles10 Feb 2026US 12,548,750 B2Agilent Technologies, Inc.
- Lens designs4 Mar 2025US 12,243,714 B2ASML Netherlands B. V.
- Particle beam system and the use thereof for flexibly setting the current intensity of individual particle beams15 Oct 2024US 12,119,204 B2Carl Zeiss MultiSEM GmbH
- Method for designing a multi-beam particle beam system having monolithic path trajectory correction plates, computer program product and multi-beam particle beam system13 Nov 2025US 2025/0349497 A1
- Lens designs17 Apr 2025US 2025/0125120 A1ASML Netherlands B. V.
- Electron beam apparatus, foil or grid lens, and method of operating an electron beam apparatus13 Mar 2025US 2025/0087442 A1ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Method for operating a multiple particle beam system while altering the numerical aperture, associated computer program product and multiple particle beam system17 Oct 2024US 2024/0347316 A1Carl Zeiss MultiSEM GmbH
- Multi-beam generating unit with increased focusing power23 May 2024US 2024/0170252 A1
Most cited
By later US patents
- Reduced path ion beam implanter37US 5,091,655 AEaton Corporation · 1992
- Objective lens arrangement usable in particle-optical systems33US 10,622,184 B2Applied Materials Israel Ltd. · 2020
- Electron optic column and scanning electron microscope24US 5,399,860 AKabushiki Kaisha Toshiba · 1995
- Ion implanter and controlling method therefor15US 5,293,508 AMitsubishi Denki Kabushiki Kaisha · 1994
- Multi-electrode cooling arrangement6US 9,165,693 B2Mapper Lithography IP B.V. · 2015