Lens designs
AssigneeASML Netherlands B.V.
InventorsLaura Del Tin, Almut Johanna Stegemann, German Aksenov, Diego Martinez Negrete Gasque, Pieter Lucas Brandt
Life of this patent
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Abstract
Disclosed herein is an multi-array lens configured in use to focus a plurality of beamlets of charged particles along a multi-beam path, wherein each lens in the array comprises: an entrance electrode; a focusing electrode and a support. The focusing electrode is down beam of the entrance electrode along a beamlet path and is configured to be at a potential different from the entrance electrode. The support is configured to support the focusing electrode relative to the entrance electrode. The focusing electrode and support are configured so that in operation the lens generates a rotationally symmetrical field around the beamlet path.
Claims20
A manipulator lensing device for focusing a beam of charged particles, wherein the manipulator lensing device comprises:
- a first structure through which is formed an opening wherein a path of a beam of charged particles through the manipulator lensing device is substantially along a longitudinal axis of the opening;
- a second structure with a surface wherein, in a plane orthogonal to the longitudinal axis and along a first portion of the longitudinal axis, the surface surrounds the opening;
- a support that, in a plane orthogonal to the longitudinal axis and along at least part of the first portion of the longitudinal axis, connects the second structure to the first structure and surrounds the second structure so that the connection between the second structure and the first structure is symmetric around the longitudinal axis;
- and
- an electrode arrangement provided on the surface of the second structure such that the electrode arrangement surrounds the longitudinal axis of the opening and, in a plane that is orthogonal to the longitudinal axis, the surface of the second structure surrounds the electrode arrangement;
- a first surface of the first structure being arranged such that, in a plane orthogonal to the longitudinal axis and along at least a second portion of the longitudinal axis of the opening, the first surface surrounds the opening;
- a second surface of the first structure being arranged such that, in a plane orthogonal to the longitudinal axis and along at least a third portion of the longitudinal axis, the second surface surrounds the opening;
- the surface of the second structure being arranged along the longitudinal axis between the first and second surfaces of the first structure
- the electrode arrangement and the first surface of the first structure being separated from each other in a direction parallel to the longitudinal axis so that there is a first gap between the electrode arrangement and the first surface of the first structure;
- and
- the electrode arrangement and the second surface of the first structure being separated from each other in a direction parallel to the longitudinal axis so that there is a second gap between the electrode arrangement and the second surface of the first structure,
- wherein, along the longitudinal axis, an extent of the support is less than an extent of the surface of the second structure and/or electrode arrangement.
An Einzel lens configured in use to focus a beam of charged particles in a beam path, wherein the Einzel lens comprises:
- a first electrode configured to be set at a first potential;
- a focusing electrode configured to be at a second potential, wherein the focusing electrode extends along and symmetrically around the beam path and the focusing electrode comprises a pole surface on a structure;
- a second electrode configured to be substantially at the first potential;
- and
- a support configured to support the focusing electrode, the electrodes being arranged along the beam path such that the focusing electrode is between the first and second electrodes, wherein the focusing electrode is configured to be electrically isolated from the first and second electrodes, wherein:
- a longitudinal extent of the structure along the longitudinal axis of the Einzel lens is longer than a longitudinal extent of the support;
- and
- the structure and support are arranged such that increasing the longitudinal extent of the structure relative to the longitudinal extent of the support increases a creep length of the focusing electrode.
Dependencies are inferred from the claim text.