H01J 2237/038
Insulating
H01J2237/038 (Insulating) appears on 83 US grants and 103 published applications in this corpus.
Search patents in H01J- Granted patents
- 83
- Published applications
- 103
- Assignees
- 54
- Inventors
- 244
- Latest grant
- 18 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 1 | 1 |
| 2007 | 0 | 3 |
| 2008 | 4 | 6 |
| 2009 | 4 | 9 |
| 2010 | 4 | 5 |
| 2011 | 4 | 4 |
| 2012 | 4 | 3 |
| 2013 | 3 | 5 |
| 2014 | 4 | 6 |
| 2015 | 5 | 4 |
| 2016 | 3 | 2 |
| 2017 | 1 | 2 |
| 2018 | 6 | 7 |
| 2019 | 5 | 0 |
| 2020 | 3 | 7 |
| 2021 | 1 | 2 |
| 2022 | 3 | 5 |
| 2023 | 6 | 9 |
| 2024 | 3 | 12 |
| 2025 | 10 | 5 |
| 2026 | 7 | 6 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Electron beam irradiation device18 Aug 2026US 12,712,143 B2Nhv Corporation
- Self-centering voltage standoff4 Aug 2026US 12,700,523 B2APPLIED Materials.Inc.
- Structure for particle acceleration and charged particle beam apparatus24 Mar 2026US 12,586,748 B2Hitachi High-Tech Corporation
- Plasma processing apparatus24 Feb 2026US 12,562,344 B2Tokyo Electron Limited
- Plasma processing apparatus and semiconductor device manufacturing method17 Feb 2026US 12,555,751 B2Tokyo Electron Limited
- Processing system for generating ion beams having tunable angle8 Oct 2026US 2026/0311953 A1APPLIED Materials.Inc.
- Insulator, Charged Particle Gun, and Charged Particle Beam Device6 Aug 2026US 2026/0229440 A1Hitachi High-Tech Corporation
- Plasma processing apparatus7 May 2026US 2026/0128260 A1Tokyo Electron Limited
- Insulation gas for high voltage component of electron microscopes9 Apr 2026US 2026/0100326 A1
- Linear accelerator having robust power feedthrough12 Mar 2026US 2026/0075697 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Stacked lens structure and method of use thereof for preventing electrical breakdown32US 7,045,794 B1Novelx, Inc. · 2006
- Inspection device27US 8,497,476 B2Ebara Corporation · 2013
- High-voltage insulation device for charged-particle optical apparatus23US 9,093,201 B2IMS Nanofabrication GmbH · 2015
- Stacked lens structure and method of use thereof for preventing electrical breakdown11US 7,335,895 B1Novelx, Inc. · 2008
- Charged-particle beam lens10US 8,710,455 B2Canon Kabushiki Kaisha · 2014