G03F 7/0217
Polyurethanes
Official title: {Polyurethanes; Epoxy resins}
G03F7/0217 (Polyurethanes) appears on 35 US grants and 12 published applications in this corpus.
Search patents in G03F- Granted patents
- 35
- Published applications
- 12
- Assignees
- 20
- Inventors
- 55
- Latest grant
- 23 Sep 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 6 | 0 |
| 1978 | 5 | 0 |
| 1979 | 0 | 0 |
| 1980 | 2 | 0 |
| 1981 | 3 | 0 |
| 1982 | 2 | 0 |
| 1983 | 0 | 0 |
| 1984 | 2 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 2 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 1 | 2 |
| 2004 | 1 | 1 |
| 2005 | 1 | 2 |
| 2006 | 0 | 0 |
| 2007 | 0 | 1 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 0 | 0 |
| 2016 | 0 | 0 |
| 2017 | 0 | 0 |
| 2018 | 0 | 1 |
| 2019 | 0 | 1 |
| 2020 | 0 | 0 |
| 2021 | 2 | 0 |
| 2022 | 0 | 1 |
| 2023 | 0 | 3 |
| 2024 | 0 | 0 |
| 2025 | 2 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Negative photosensitive resin composition, pattern formation method, and laminated film23 Sep 2025US 12,422,747 B2San-Apro Ltd.
- Resin composition and flow cells incorporating the same29 Apr 2025US 12,287,574 B2Illumina, Inc.
- Compound, composition, and method for producing same, underlayer film forming material for lithography, composition for underlayer film formation for lithography, and purification method20 Jul 2021US 11,067,889 B2Mitsubishi Gas Chemical Company, Inc.
- Black photosensitive resin composition and black column spacer prepared therefrom5 Jan 2021US 10,884,335 B2Rohm and Haas Electronic Materials Korea Ltd.
- Photosensitive compositions having mixtures of alkoxy and non-alkoxy diazonium salt containing compounds1 Mar 2005US 6,861,196 B2Kodak Polychrome Graphics LLC
- Welding method for creating an upscaled master7 Sep 2023US 2023/0280649 A1
- Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device27 Jul 2023US 2023/0236502 A1FUJIFILM Corporation
- Negative photosensitive resin composition, pattern formation method, and laminated film27 Jul 2023US 2023/0236505 A1San-Apro Ltd.
- Resin composition and flow cells incorporating the same22 Dec 2022US 2022/0404699 A1Illumina, Inc.
- Black photosensitive resin composition and black column spacer prepared therefrom17 Jan 2019US 2019/0018318 A1Rohm and Haas Electronic Materials Korea Ltd.
Most cited
By later US patents
- Epoxide blend for polymerizable coating compositions and process31US 3,936,557 AAmerican Can Company · 1976
- Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group31US 4,877,711 AFuji Photo Film Co., Ltd. · 1989
- Copolymer of glycidyl methacrylate and allyl glycidyl ether20US 4,054,635 AAmerican Can Company · 1977
- Light-sensitive composition20US 4,950,582 AFuji Photo Film Co., Ltd. · 1990
- Light-sensitive copying composition19US 4,186,017 AHoechst Aktiengesellschaft · 1980