Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
AssigneeFUJIFILM Corporation
InventorsMasafumi KOJIMA, Aina Ushiyama, Yosuke Bekki, Akiyoshi Goto, Michihiro Shirakawa
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Abstract
The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition capable of obtaining a pattern having a good shape, a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a salt including a cation represented by Formula (X) and a resin of which polarity increases through decomposition by the action of an acid.
Claims20
An actinic ray-sensitive or radiation-sensitive resin composition comprising:
- a salt including a cation represented by Formula (X);
- and
- a resin of which polarity increases through decomposition by an action of an acid,
- in Formula (X), ArX represents an aryl group substituted with a group including a halogen atom, the aryl group may be substituted with a substituent including no halogen atom, RX11 to RX16 each independently represent a hydrogen atom or a hydrocarbon group, LX represents a divalent linking group, and n and m each independently represent an integer of 1 or more.
Dependencies are inferred from the claim text.