Copolymer of glycidyl methacrylate and allyl glycidyl ether

A method for direct application of information from a photoresist image which comprises admixing (a) a copolymer of glycidyl methacrylate and allyl glycidyl ether having an inherent viscosity of at least about 0.25, an epoxide equivalent of at least about 0.65 epoxide equivalent per 100 grams of polymer derived from reaction of a mixture consisting essentially of the monomers containing from about a 4 to 5 molar excess of glycidyl methacrylate in the presence of a free-radical polymerization catalyst and a solvent at a temperature below about 100.degree. C, with (b) a photosensitive aromatic diazonium salt of a complex halogenide which decomposes upon exposure to radiation to release a halide Lewis Acid effective to initiate polymerization of said copolymer selected from compounds having the general formula (ArN.sub.2).sub.m (MX.sub.n+m).sup.-m wherein Ar is an aryl or substituted aryl group, X is chlorine or fluorine, M is P, n is the oxidation state of M, and m is the number of diazonium groups as determined by the net charge on the anion (MX.sub.n+m);

• applying said mixture to a substrate, screening predetermined portions of said substrate, exposing the substrate to electron beam or electromagnetic irradiation to effect polymerization of said copolymer, removing said screening means, applying a solvent to remove unpolymerized portions on said substrate to obtain a photoresist image, contacting said photoresist image with a thermoplastic material at a temperature below the softening point of said substrate and of said photoresist image and exerting sufficient pressure to obtain replicated impressions of said photoresist image on said thermoplastic material.