Resin composition and flow cells incorporating the same

A resin composition, comprising:

• an epoxy resin matrix;
• a first photoacid generator including an anion having a molecular weight less than 250 g/mol;
• and
• a second photoacid generator including an anion having a molecular weight greater than about 300 g/mol;
• wherein i) a cation of the first photoacid generator has, or ii) a cation of the second photoacid generator has, or iii) the cations of the first and second photoacid generators have a mass attenuation coefficient of at least 0.1 L/(g*cm) at a wavelength of incident light to cure the resin composition;
• and wherein the first photoacid generator is selected from the group consisting of bis-(4-methylphenyl) iodonium hexafluorophosphate, triphenylsulfonium hexafluorophosphate, diaryliodonium hexafluorophosphate, and diaryliodonium hexafluoroantimonate.

A resin composition, comprising:

• an epoxy resin matrix including an epoxy functionalized polyhedral oligomeric silsesquioxane;
• a first photoacid generator including an anion having a molecular weight less than about 250 g/mol;
• and
• a second photoacid generator including an anion having a molecular weight ranging from about 300 g/mol to about 1,000 g/mol;
• wherein i) a cation of the first photoacid generator has, or ii) a cation of the second photoacid generator has, or iii) the cations of the first and second photoacid generators have a mass attenuation coefficient of at least 0.1 L/(g*cm) at the wavelength of incident light to cure the resin composition.

A flow cell, comprising:

• a substrate;
• and
• a cured, patterned resin on the substrate, the cured, patterned resin including depressions separated by interstitial regions, and the cured, patterned resin including a cured form of a resin composition including:
• an epoxy resin matrix;
• a first photoacid generator including an anion having a molecular weight less than about 250 g/mol;
• and
• a second photoacid generator including an anion having a molecular weight greater than about 300 g/mol;
• wherein i) a cation of the first photoacid generator has, or ii) a cation of the second photoacid generator has, or iii) the cations of the first and second photoacid generators have a mass attenuation coefficient of at least 0.1 L/(g*cm) at a wavelength of incident light to cure the resin composition.

A method of making a flow cell, comprising:

• depositing a resin composition on a substrate, the resin composition including:
• an epoxy resin matrix;
• a first photoacid generator including an anion having a molecular weight less than about 250 g/mol;
• and
• a second photoacid generator including an anion having a molecular weight greater than about 300 g/mol;
• wherein i) a cation of the first photoacid generator has, or ii) a cation of the second photoacid generator has, or iii) the cations of the first and second photoacid generators have a mass attenuation coefficient of at least 0.1 L/(g*cm) at a wavelength of incident light to cure the resin composition;
• nanoimprinting the deposited resin composition using a working stamp;
• and
• exposing the nanoimprinted, deposited resin composition to the incident light at an energy dose ranging from about 0.5 J to about 10 J for 30 seconds or less to form a cured, patterned resin.

A resin composition, comprising:

• an epoxy resin matrix;
• a first photoacid generator including a first anion having a first molecular weight;
• and
• a second photoacid generator including a second anion having a second molecular weight that is at least 50 g/mol greater than the first molecular weight;
• wherein i) a cation of the first photoacid generator has, or ii) a cation of the second photoacid generator has, or iii) the cations of the first and second photoacid generators have a mass attenuation coefficient of at least 0.1 L/(g*cm) at the wavelength of incident light to cure the resin composition;
• and wherein the epoxy resin matrix comprises an epoxy material selected from the group consisting of an epoxy functionalized silsesquioxane;
• trimethylolpropane triglycidyl ether;
• tetrakis(epoxycyclohexyl ethyl)tetramethyl cyclotetrasiloxane;
• a copolymer of (epoxycyclohexylethyl)methylsiloxane and dimethylsiloxane;
• 1,3-bis[2-(3,4-epoxycyclohexyl) ethyl]tetramethyl disiloxane;
• 1,3-bis(glycidoxypropyl) tetramethyl disiloxane;
• 3,4-epoxycyclohexylmethyl-3,4-epoxycyclo-hexanecarboxylate;
• bis((3,4-epoxycyclohexyl)methyl) adipate;
• 4-vinyl-1-cyclohexene 1,2-epoxide;
• vinylcyclohexene dioxide;
• 4,5-epoxytetrahydrophthalic acid diglycidylester;
• 1,2-epoxy-3-phenoxypropane;
• glycidyl methacrylate;
• 1,2-epoxyhexadecane;
• poly(ethylene glycol) diglycidylether;
• pentaerythritol glycidyl ether;
• diglycidyl 1,2-cyclohexanedicarboxylate;
• tetrahydrophthalic acid diglycidyl ester;
• and combinations thereof.