G03F 7/016
Diazonium salts or compounds
Official title: Diazonium salts or compounds (G03F7/075 takes precedence)
G03F7/016 (Diazonium salts or compounds) appears on 351 US grants and 90 published applications in this corpus.
Search patents in G03F- Granted patents
- 351
- Published applications
- 90
- Assignees
- 119
- Inventors
- 619
- Latest grant
- 23 Sep 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 5 | 0 |
| 1977 | 8 | 0 |
| 1978 | 13 | 0 |
| 1979 | 7 | 0 |
| 1980 | 8 | 0 |
| 1981 | 25 | 0 |
| 1982 | 5 | 0 |
| 1983 | 12 | 0 |
| 1984 | 10 | 0 |
| 1985 | 16 | 0 |
| 1986 | 14 | 0 |
| 1987 | 6 | 0 |
| 1988 | 14 | 0 |
| 1989 | 13 | 0 |
| 1990 | 18 | 0 |
| 1991 | 10 | 0 |
| 1992 | 9 | 0 |
| 1993 | 17 | 0 |
| 1994 | 12 | 0 |
| 1995 | 13 | 0 |
| 1996 | 6 | 0 |
| 1997 | 11 | 0 |
| 1998 | 12 | 0 |
| 1999 | 6 | 0 |
| 2000 | 6 | 0 |
| 2001 | 10 | 0 |
| 2002 | 2 | 8 |
| 2003 | 9 | 13 |
| 2004 | 8 | 6 |
| 2005 | 6 | 9 |
| 2006 | 4 | 10 |
| 2007 | 6 | 1 |
| 2008 | 1 | 1 |
| 2009 | 3 | 2 |
| 2010 | 4 | 1 |
| 2011 | 0 | 0 |
| 2012 | 1 | 1 |
| 2013 | 0 | 1 |
| 2014 | 1 | 3 |
| 2015 | 0 | 3 |
| 2016 | 2 | 3 |
| 2017 | 4 | 3 |
| 2018 | 1 | 2 |
| 2019 | 3 | 3 |
| 2020 | 1 | 5 |
| 2021 | 3 | 2 |
| 2022 | 1 | 3 |
| 2023 | 3 | 4 |
| 2024 | 0 | 1 |
| 2025 | 2 | 4 |
| 2026 | 0 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Negative photosensitive resin composition, pattern formation method, and laminated film23 Sep 2025US 12,422,747 B2San-Apro Ltd.
- Resin composition and flow cells incorporating the same29 Apr 2025US 12,287,574 B2Illumina, Inc.
- Enhanced EUV photoresist materials, formulations and processes20 Jun 2023US 11,681,227 B2
- Photosensitive resin composition, organic EL element barrier rib, and organic EL element7 Mar 2023US 11,599,023 B2Showa Denko K. K.
- Photoresist composition, its manufacturing method, and manufacturing methods of metal pattern and array substrate28 Feb 2023US 11,592,742 B2Boe Technology Group Co., Ltd.
- Composition for forming thin film and method of manufacturing semiconductor element29 Jan 2026US 2026/0029712 A1Daicel Corporation
- Curable composition, cured film, and display device15 May 2025US 2025/0155803 A1Sumitomo Chemical Company, Limited
- Resist Material And Patterning Process17 Apr 2025US 2025/0123559 A1Shin-Etsu Chemical Co., Ltd.
- Method of forming patterns10 Apr 2025US 2025/0115691 A1Samsung SDI.Co., Ltd.
- Pattern forming method and method for manufacturing electronic device13 Mar 2025US 2025/0085628 A1FUJIFILM Corporation
Most cited
By later US patents
- Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone645US 4,491,628 AInternational Business Machines Corporation · 1985
- Radiation-sensitive recording material for the production of driographic offset printing plates328US 6,274,285 B1Agfa-Gevaert · 2001
- (Disulfonyl diazomethane compounds)163US 6,153,733 ADaito Chemix Corporation · 2000
- Radiation-sensitive composition and recording material based on compounds which can be split by acid87US 4,678,737 AHoechst Aktiengesellschaft · 1987
- Water-soluble photopolymer and method of forming pattern by use of the same85US 4,745,042 AMatsushita Electric Industrial Co., Ltd. · 1988