G03F 7/0163
Non ionic diazonium compounds
Official title: {Non ionic diazonium compounds, e.g. diazosulphonates; Precursors thereof, e.g. triazenes}
G03F7/0163 (Non ionic diazonium compounds) appears on 33 US grants and 8 published applications in this corpus.
Search patents in G03F- Granted patents
- 33
- Published applications
- 8
- Assignees
- 21
- Inventors
- 74
- Latest grant
- 16 Oct 2018
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 1 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 3 | 0 |
| 1987 | 0 | 0 |
| 1988 | 2 | 0 |
| 1989 | 1 | 0 |
| 1990 | 2 | 0 |
| 1991 | 2 | 0 |
| 1992 | 3 | 0 |
| 1993 | 4 | 0 |
| 1994 | 2 | 0 |
| 1995 | 2 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 1 | 0 |
| 2001 | 1 | 0 |
| 2002 | 0 | 1 |
| 2003 | 1 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 1 |
| 2007 | 1 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 2 |
| 2015 | 0 | 1 |
| 2016 | 2 | 0 |
| 2017 | 1 | 1 |
| 2018 | 1 | 0 |
| 2019 | 0 | 1 |
| 2020 | 0 | 1 |
By publication year. Applications have been published since 2001.
Recent patents
- Compound, polymer, photosensitive resin composition, and color filter16 Oct 2018US 10,101,655 B2Samsung SDI.Co., Ltd.
- Materials and methods for improved photoresist performance26 Dec 2017US 9,851,636 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Amine treated maleic anhydride polymers, compositions and applications thereof23 Aug 2016US 9,422,376 B2Sumitomo Bakelite Co., Ltd.
- Photoresist composition and method for forming a metal pattern16 Aug 2016US 9,417,521 B2Samsung Display Co., Ltd.
- Method for forming a resist film on a substrate having non-uniform topography3 Apr 2007US 7,199,062 B2Infineon Technologies AG
- High-resolution flexographic printing plate and means for producing same26 Mar 2020US 2020/0096868 A1Folex AG
- Photosensitive resin composition, cured film, display device, and pattern forming method28 Mar 2019US 2019/0094692 A1Tokyo Ohka Kogyo.Co., Ltd.
- Compound, polymer, photosensitive resin composition, and color filter31 Aug 2017US 2017/0248846 A1Samsung SDI.Co., Ltd.
- Amine treated maleic anhydride polymers, compositions and applications thereof19 Mar 2015US 2015/0079506 A1Promerus, LLC
- Photoresist composition and method for forming a metal pattern3 Jul 2014US 2014/0183162 A1Samsung Display Co., Ltd.
Most cited
By later US patents
- (Disulfonyl diazomethane compounds)163US 6,153,733 ADaito Chemix Corporation · 2000
- Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an .alpha.,.alpha.-bis(sulfonyl) diazo methane as an acid forming compound28US 5,338,641 AHoechst Aktiengesellschaft · 1994
- Ultra-violet lithographic resist composition and process26US 4,339,522 AInternational Business Machines Corporation · 1982
- Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an .alpha.-carbonyl-.alpha.-sulfonyl diazomethane, a water-insoluble binder and an acid cleavable compound20US 5,340,682 AHoechst Aktiengesellschaft · 1994
- Poly (disulfonyl diazomethane) compound and positive-working chemical-amplification photoresist composition containing the same20US 6,180,313 B2Tokyo Ohka Kogyo.Co., Ltd. · 2001