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US 9,851,636 B2Granted
Materials and methods for improved photoresist performance
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChen-Yu Liu, Ching-Yu Chang
Life of this patent
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Abstract
A photosensitive material and methods of making a pattern on a substrate are disclosed. The photosensitive material includes a polymer that turns soluble to a developer solution after a chemically amplified reaction, and at least one chemical complex having a single diffusion length. The material includes at least one photo-acid generator (PAG) linked to at least one photo decomposable base (PDB) or quencher.
Claims20
A photosensitive material, comprising:
- a polymer that turns soluble to a developer solution after a chemically amplified reaction;
- and
- at least one chemical complex comprising at least one photo-acid generator (PAG), at least one photo decomposable base (PDB) or quencher, and a linking compound that links the PAG to the PDB or quencher through covalent bonding, the linking compound being a polyethylene glycol,
- wherein the chemical complex has a single diffusion length.
1 more element
A photosensitive material, comprising:
- a polymer that turns soluble to a developer solution after a chemically amplified reaction;
- at least one photo-acid generator (PAG);
- and
- at least one photo decomposable base (PDB) or quencher, wherein the PAG and the PDB or quencher have substantially similar diffusion lengths, wherein the at least one PAG is linked to the at least one PDB or quencher by a linking agent, wherein the linking agent is a polyethylene glycol or a polycyclic aromatic hydrocarbon.
1 more element
A photosensitive material comprising:
- a polymer that turns soluble to a developer solution after a chemically amplified reaction;
- a photo-acid generator;
- and
- a material selected from the group consisting of a photo decomposable base and a quencher, wherein the photo-acid generator is linked to the material by a polycyclic aromatic hydrocarbon.
1 more element
Dependencies are inferred from the claim text.