Compound, composition, and method for producing same, underlayer film forming material for lithography, composition for underlayer film formation for lithography, and purification method

A composition for underlayer film formation for lithography comprising

• an underlayer film forming material for lithography, a solvent, and at least one selected from the groups consisting of an acid generating agent and a crosslinking agent,
• wherein the film forming material for lithography comprises a compound represented by the following formula (1)
• wherein R1 is a 2n-valent group of 1 to 60 carbon atoms or a single bond;
• R2 to R5 are each independently a linear, branched, or cyclic alkyl group of 1 to 30 carbon atoms, an aryl group of 6 to 30 carbon atoms, an alkenyl group of 2 to 30 carbon atoms, a group represented by the following formula (A), a thiol group, or a hydroxy group, wherein at least one selected from the group consisting of R2 and R3 is a group represented by the following formula (A);
• at least one selected from the group consisting of R4 and R5 is a group represented by the following formula (A);
• m2 and m3 are each independently an integer of 0 to 8;
• m4 and m5 are each independently an integer of 0 to 9, provided that m2 and m3 are not 0 at the same time and m4 and m5 are not 0 at the same time;
• n is an integer of 1 to 4;
• and p2 to p5 are each independently an integer of 0 to 2:
• wherein each R6 is independently an alkylene group of 1 to 4 carbon atoms;
• and m′ is an integer of 1 or larger.

A compound represented by the following formula (1):

• wherein R1 is a 2n-valent group of 1 to 60 carbon atoms or a single bond;
• R2 to R5 are each independently a linear, branched, or cyclic alkyl group of 1 to 30 carbon atoms, an aryl group of 6 to 30 carbon atoms, an alkenyl group of 2 to 30 carbon atoms, a group represented by the following formula (A), a group represented by the following formula (B), a thiol group, or a hydroxy group, wherein at least one selected from the group consisting of R2 and R3 is a group represented by the following formula (A);
• at least one selected from the group consisting of R4 and R5 is a group represented by the following formula (A);
• m2 and m3 are each independently an integer of 0 to 8;
• m4 and m5 are each independently an integer of 0 to 9, provided that m2 and m3 are not 0 at the same time and m4 and m5 are not 0 at the same time;
• n is an integer of 1 to 4;
• and p2 to p5 are each independently an integer of 0 to 2:
• wherein each R6 is independently an alkylene group of 1 to 4 carbon atoms;
• and m′ is an integer of 1 or larger, and
• wherein R6 is as defined above;
• R7 is a hydrogen atom or a methyl group;
• and m″ is 0 or an integer of 1 or larger.