Negative photosensitive resin composition, pattern formation method, and laminated film

A negative photosensitive resin composition comprising:

• an epoxy group-containing resin (A);
• and
• a cationic polymerization initiator (I),
• wherein the cationic polymerization initiator (I) includes a sulfonium salt (I0) represented by General Formula (I0),
• wherein in Formula (I0), R1 and R2 each represent an aryl group having 6 to 30 carbon atoms, a heterocyclic hydrocarbon group having 4 to 30 carbon atoms, or an alkyl group having 1 to 30 carbon atoms, in which a part of hydrogen atoms in the aryl group, the heterocyclic hydrocarbon group, or the alkyl group may be substituted with a substituent (t), the substituent (t) being at least one selected from the group consisting of an alkyl group having 1 to 18 carbon atoms, a hydroxy group, an alkoxy group having 1 to 18 carbon atoms, an alkylcarbonyl group having 2 to 18 carbon atoms, an arylcarbonyl group having 7 to 11 carbon atoms, an acyloxy group having 2 to 19 carbon atoms, an arylthio group having 6 to 20 carbon atoms, an alkylthio group having 1 to 18 carbon atoms, an aryl group having 6 to 10 carbon atoms, a heterocyclic hydrocarbon group having 4 to 20 carbon atoms, an aryloxy group having 6 to 10 carbon atoms, a hydroxy(poly)alkyleneoxy group represented by HO(—RAO)q—RAO represents an ethyleneoxy group and/or a propyleneoxy group and q represents an integer of 1 to 5, and a halogen atom, R3 to R5 are each an alkyl group, a hydroxy group, an alkoxy group, an alkylcarbonyl group, an arylcarbonyl group, an acyloxy group, an arylthio group, an alkylthio group, an aryl group, a heterocyclic hydrocarbon group, an aryloxy group, a hydroxy(poly)alkyleneoxy group, or a halogen atom, k, m, and n represent the numbers of R3, R4, and R5, in which k is an integer of 0 to 4, m is an integer of 0 to 3, and n is an integer of 1 to 4, in a case where each of k, m, and n is 2 or more, a plurality of R3's, R4's, or R5's may be the same or different from each other, A is a group represented by —S—, —O—, —SO—, —SO2−, or —CO—, 0 is an oxygen atom, S is a sulfur atom, and X− represents a monovalent polyatomic anion}.