G03F 1/60
Substrates
G03F1/60 (Substrates) appears on 319 US grants and 385 published applications in this corpus.
Search patents in G03F- Granted patents
- 319
- Published applications
- 385
- Assignees
- 121
- Inventors
- 681
- Latest grant
- 18 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 3 | 0 |
| 1984 | 1 | 0 |
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 2 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 3 | 0 |
| 1996 | 2 | 0 |
| 1997 | 4 | 0 |
| 1998 | 2 | 0 |
| 1999 | 5 | 0 |
| 2000 | 4 | 0 |
| 2001 | 3 | 3 |
| 2002 | 7 | 12 |
| 2003 | 8 | 9 |
| 2004 | 11 | 14 |
| 2005 | 6 | 14 |
| 2006 | 6 | 13 |
| 2007 | 6 | 9 |
| 2008 | 9 | 20 |
| 2009 | 15 | 9 |
| 2010 | 14 | 17 |
| 2011 | 17 | 17 |
| 2012 | 10 | 6 |
| 2013 | 11 | 16 |
| 2014 | 11 | 12 |
| 2015 | 7 | 14 |
| 2016 | 13 | 15 |
| 2017 | 14 | 19 |
| 2018 | 14 | 25 |
| 2019 | 16 | 14 |
| 2020 | 20 | 22 |
| 2021 | 12 | 19 |
| 2022 | 15 | 22 |
| 2023 | 14 | 24 |
| 2024 | 8 | 16 |
| 2025 | 12 | 9 |
| 2026 | 8 | 15 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Photomask including line pattern monitoring mark and method of manufacturing integrated circuit device using the same18 Aug 2026US 12,710,693 B2Samsung Electronics Co., Ltd.
- Multilayered-reflective-film-provided substrate, reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device4 Aug 2026US 12,699,314 B2Hoya Corporation
- Mask blanks substrate and method for manufacturing the same2 Jun 2026US 12,645,137 B2Shin-Etsu Chemical Co., Ltd.
- Photochemical and thermal release layer processes and uses in device manufacturing7 Apr 2026US 12,596,306 B2Terecircuits Corporation
- Method and apparatus for manufacturing a photomask from a blank mask3 Mar 2026US 12,566,369 B2SK enpulse Co., Ltd.
- Photomask and method of manufacturing or repairing photomask1 Oct 2026US 2026/0299399 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Substrate processing method, substrate processing apparatus, and method for manufacturing original plate6 Aug 2026US 2026/0227690 A1
- Substrate treating method and substrate treating apparatus23 Jul 2026US 2026/0215232 A1SCREEN Holdings Co., Ltd.
- Photomask, method of forming pattern using the same, method of manufacturing display device using the same and electronic device including display device9 Jul 2026US 2026/0194806 A1Samsung Display Co., Ltd.
- Method and apparatus for correcting an optical element with inhomogeneous material properties18 Jun 2026US 2026/0169393 A1
Most cited
By later US patents
- Globally planarized binary optical mask using buried absorbers146US 5,474,865 ASematech, Inc. · 1995
- Transparent elastomeric, contact-mode photolithography mask, sensor, and wavefront engineering element83US 6,753,131 B1President and Fellows of Harvard College · 2004
- Very large area patterning system for flexible substrates59US 6,018,383 AAnvik Corporation · 2000
- Process for manufacturing semiconductor integrated circuit device, exposure method and mask for the process52US 5,418,092 AHitachi, Ltd. · 1995
- Method of surface treatment45US 4,569,717 ADainippon Screen Mfg.Co., Ltd. · 1986