G01N 21/211
Ellipsometry
Official title: {Ellipsometry (optical thickness measurement G01B11/06)}
G01N21/211 (Ellipsometry) appears on 1,128 US grants and 931 published applications in this corpus.
Search patents in G01N- Granted patents
- 1,128
- Published applications
- 931
- Assignees
- 396
- Inventors
- 1,679
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 4 | 0 |
| 1977 | 2 | 0 |
| 1978 | 4 | 0 |
| 1979 | 1 | 0 |
| 1980 | 2 | 0 |
| 1981 | 1 | 0 |
| 1982 | 2 | 0 |
| 1983 | 1 | 0 |
| 1984 | 2 | 0 |
| 1985 | 2 | 0 |
| 1986 | 1 | 0 |
| 1987 | 4 | 0 |
| 1988 | 3 | 0 |
| 1989 | 6 | 0 |
| 1990 | 3 | 0 |
| 1991 | 6 | 0 |
| 1992 | 6 | 0 |
| 1993 | 2 | 0 |
| 1994 | 10 | 0 |
| 1995 | 7 | 0 |
| 1996 | 15 | 0 |
| 1997 | 10 | 0 |
| 1998 | 14 | 0 |
| 1999 | 22 | 0 |
| 2000 | 8 | 0 |
| 2001 | 22 | 10 |
| 2002 | 29 | 53 |
| 2003 | 31 | 40 |
| 2004 | 51 | 70 |
| 2005 | 55 | 64 |
| 2006 | 66 | 50 |
| 2007 | 89 | 46 |
| 2008 | 69 | 38 |
| 2009 | 47 | 45 |
| 2010 | 43 | 37 |
| 2011 | 37 | 22 |
| 2012 | 28 | 23 |
| 2013 | 37 | 29 |
| 2014 | 25 | 27 |
| 2015 | 28 | 27 |
| 2016 | 35 | 34 |
| 2017 | 18 | 19 |
| 2018 | 35 | 30 |
| 2019 | 34 | 36 |
| 2020 | 40 | 33 |
| 2021 | 35 | 38 |
| 2022 | 25 | 34 |
| 2023 | 34 | 41 |
| 2024 | 30 | 29 |
| 2025 | 32 | 30 |
| 2026 | 15 | 26 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Optical measurement apparatus and optical measurement method29 Sep 2026US 12,748,039 B2Samsung Electronics Co., Ltd.
- Method and system for optical characterization of patterned samples22 Sep 2026US 12,742,724 B2Nova Ltd.
- Quasi-dynamic in situ ellipsometry method and system for measuring photoresist exposure process8 Sep 2026US 12,730,383 B2Huazhong University of Science and Technology
- Measurement system with detection mechanism and method of operation thereof28 Jul 2026US 12,693,210 B1Park Systems Corp.
- Spectroscopic ellipsometry system for thin film imaging9 Jun 2026US 12,650,375 B2Bruker Nano, Inc.
- Dark field defect inspection system and inspection method thereof8 Oct 2026US 2026/0309637 A1Samsung Electronics Co., Ltd.
- Multiple Azimuth, Multiple Pass Optical Measurements Of Semiconductor Structures1 Oct 2026US 2026/0298807 A1
- Functional layer inspection method and functional layer inspection device10 Sep 2026US 2026/0266712 A1Samsung Display Co., Ltd.
- Multi-Function Optical Analyzer27 Aug 2026US 2026/0251553 A1Board of Trustees of Michigan State University
- Apparatus and method for semiconductor oxide film ellipsometric amplitude sensor20 Aug 2026US 2026/0243660 A1Korea Research Institue of Standards and Science
Most cited
By later US patents
- Focused beam spectroscopic ellipsometry method and system534US 5,608,526 ATencor Instruments · 1997
- Method and apparatus for measuring thickness of thin films362US 4,999,014 ATherma-Wave, Inc. · 1991
- High resolution ellipsometric apparatus348US 5,042,951 ATherma-Wave, Inc. · 1991
- Optical biosensor system268US 5,313,264 APharmacia Biosensor AB · 1994
- Methods and systems for determining a critical dimension and a thin film characteristic of a specimen248US 6,633,831 B2KLA-Tencor Technologies Corporation · 2003