C30B 31/10
Reaction chambers
Official title: Reaction chambers; Selection of materials therefor
C30B31/10 (Reaction chambers) appears on 126 US grants and 25 published applications in this corpus.
Search patents in C30B- Granted patents
- 126
- Published applications
- 25
- Assignees
- 75
- Inventors
- 248
- Latest grant
- 10 Oct 2023
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 6 | 0 |
| 1977 | 3 | 0 |
| 1978 | 3 | 0 |
| 1979 | 1 | 0 |
| 1980 | 2 | 0 |
| 1981 | 1 | 0 |
| 1982 | 6 | 0 |
| 1983 | 6 | 0 |
| 1984 | 2 | 0 |
| 1985 | 2 | 0 |
| 1986 | 5 | 0 |
| 1987 | 1 | 0 |
| 1988 | 8 | 0 |
| 1989 | 6 | 0 |
| 1990 | 8 | 0 |
| 1991 | 6 | 0 |
| 1992 | 1 | 0 |
| 1993 | 5 | 0 |
| 1994 | 3 | 0 |
| 1995 | 3 | 0 |
| 1996 | 6 | 0 |
| 1997 | 4 | 0 |
| 1998 | 4 | 0 |
| 1999 | 3 | 0 |
| 2000 | 7 | 0 |
| 2001 | 4 | 1 |
| 2002 | 5 | 0 |
| 2003 | 1 | 3 |
| 2004 | 1 | 2 |
| 2005 | 0 | 3 |
| 2006 | 2 | 2 |
| 2007 | 1 | 3 |
| 2008 | 1 | 1 |
| 2009 | 2 | 0 |
| 2010 | 1 | 0 |
| 2011 | 1 | 0 |
| 2012 | 0 | 0 |
| 2013 | 1 | 1 |
| 2014 | 0 | 1 |
| 2015 | 0 | 0 |
| 2016 | 0 | 0 |
| 2017 | 0 | 0 |
| 2018 | 0 | 0 |
| 2019 | 0 | 1 |
| 2020 | 0 | 2 |
| 2021 | 1 | 1 |
| 2022 | 1 | 2 |
| 2023 | 2 | 1 |
| 2024 | 0 | 0 |
| 2025 | 0 | 0 |
| 2026 | 0 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Method for depositing low temperature phosphorous-doped silicon10 Oct 2023US 11,781,243 B2ASM IP Holding B. V.
- Apparatus for the manufacture of synthetic diamonds using differential expansion11 Apr 2023US 11,623,194 B2Gull Inc.
- Method of decomposing quartz sample, method of analyzing metal contamination of quartz sample, and method of manufacturing quartz member23 Aug 2022US 11,421,342 B2Sumco Corporation
- Process chamber with resistive heating7 Sep 2021US 11,111,600 B1Svagos Technik, Inc.
- Device for doping, deposition or oxidation of semiconductor material at low pressure11 Jun 2013US 8,460,468 B2Centrotherm Photovoltaics AG
- Silicon carbide epitaxial substrate and method of manufacturing the same1 Oct 2026US 2026/0297799 A1
- Apparatus and methods for the manufacture of synthetic diamonds and cubic boron nitride3 Aug 2023US 2023/0241568 A1Gull Inc.
- Exposure of a silicon ribbon to gas in a furnace12 May 2022US 2022/0145494 A1
- Wafer boat structure, as well as wafer boat assembly and diffusion furnace with same12 May 2022US 2022/0148899 A1
- Method for depositing low temperature phosphorous-doped silicon19 Aug 2021US 2021/0254238 A1ASM IP Holding B. V.
Most cited
By later US patents
- Movable core fast cool-down furnace577US 4,753,192 ABTU Engineering Corporation · 1988
- Semiconductor wafer-processing apparatus425US 5,069,591 ATel Sagami Limited · 1991
- High performance horizontal diffusion furnace system399US 5,461,214 AThermtec, Inc. · 1995
- Staggered ribs on process chamber to reduce thermal effects395US 7,108,753 B2ASM America, Inc. · 2006
- Dual vertical thermal processing furnace364US 5,820,366 AEaton Corporation · 1998