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  1. Technology classes
  2. /C · Chemistry
  3. /C30 · Crystal growth
  4. /C30B · Single-crystal growth
  5. /C30B 31/00 · Diffusion or doping processes for single crystals or homogeneous polycrystalline material with
  6. /C30B 31/06 · Diffusion or doping processes for single crystals or homogeneous polycrystalline material with
  7. /C30B 31/10 · Reaction chambers
  8. /C30B 31/106
C30B 31/106

Continuous processes

Official title: {Continuous processes}

C30B31/106 (Continuous processes) appears on 4 US grants and 0 published applications in this corpus.

Search patents in C30B

Where it sits

  1. CChemistry
  2. C30Crystal growth
  3. C30BSingle-crystal growth
  4. C30B 31/00Diffusion or doping processes for single crystals or homogeneous polycrystalline material with
  5. C30B 31/06Diffusion or doping processes for single crystals or homogeneous polycrystalline material with
  6. C30B 31/10Reaction chambers
  7. C30B 31/106Continuous processes
Granted patents
4
Published applications
0
Assignees
3
Inventors
14
Latest grant
28 Jun 1994

Filings by year

Granted patentsPublished applications
C30B 31/106: granted patents and published applications per publication year
YearGranted patentsPublished applications
197820
197910
198000
198100
198200
198300
198400
198500
198600
198700
198800
198900
199000
199100
199200
199300
199410

197819881994

By publication year. Applications have been published since 2001.

Recent patents

  • Transport system, in particular for transporting silicon monocrystals through the tank of a research reactor28 Jun 1994US 5,324,331 A
  • Apparatus for thermal diffusion by high frequency induction heating of semiconductor substrates3 Apr 1979US 4,147,432 ANippondenso Co., Ltd.
  • Apparatus for heat treating semiconductor wafers4 Jul 1978US 4,098,223 ASiemens Aktiengesellschaft
  • Apparatus for thermal diffusion of semiconductor devices28 Feb 1978US 4,075,972 ANippondenso Co., Ltd.

No published applications in this class yet.

Most cited

By later US patents
  • Apparatus for heat treating semiconductor wafers13US 4,098,223 ASiemens Aktiengesellschaft · 1978
  • Apparatus for thermal diffusion of semiconductor devices12US 4,075,972 ANippondenso Co., Ltd. · 1978
  • Apparatus for thermal diffusion by high frequency induction heating of semiconductor substrates8US 4,147,432 ANippondenso Co., Ltd. · 1979

Top assignees

Documents
  • NNippondenso Co., Ltd.1
  • NNippondenso Co., Ltd.1
  • Siemens Aktiengesellschaft1

Often classified with

  • H10PGeneric processes or apparatus for the manufacture or treatment of devices covered2
  • Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests2
  • B65GTransport or storage devices1
  • G21CNuclear reactors1
  • Y02EClean energy generation and storage1

Documents that also carry the other class.

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