C23C 16/45593
Recirculation of reactive gases
Official title: {Recirculation of reactive gases}
C23C16/45593 (Recirculation of reactive gases) appears on 65 US grants and 104 published applications in this corpus.
Search patents in C23C- Granted patents
- 65
- Published applications
- 104
- Assignees
- 80
- Inventors
- 271
- Latest grant
- 11 Mar 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1984 | 1 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 2 | 0 |
| 1999 | 0 | 0 |
| 2000 | 2 | 0 |
| 2001 | 1 | 3 |
| 2002 | 0 | 5 |
| 2003 | 3 | 8 |
| 2004 | 6 | 8 |
| 2005 | 5 | 3 |
| 2006 | 0 | 3 |
| 2007 | 1 | 4 |
| 2008 | 1 | 2 |
| 2009 | 0 | 9 |
| 2010 | 3 | 4 |
| 2011 | 1 | 3 |
| 2012 | 4 | 4 |
| 2013 | 4 | 3 |
| 2014 | 1 | 3 |
| 2015 | 0 | 2 |
| 2016 | 3 | 2 |
| 2017 | 1 | 5 |
| 2018 | 1 | 4 |
| 2019 | 3 | 3 |
| 2020 | 4 | 4 |
| 2021 | 2 | 4 |
| 2022 | 3 | 2 |
| 2023 | 3 | 1 |
| 2024 | 4 | 9 |
| 2025 | 1 | 3 |
| 2026 | 0 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Hydrogen recycle system and hydrogen recycle method11 Mar 2025US 12,246,963 B2National University Corporation Tokai National Higher Education and Research System
- Facility for treating the surface of a moving substrate in a controlled atmosphere, and method for defining the size thereof22 Oct 2024US 12,125,681 B2Coating Plasma Innovation
- Hydrogen recycle system and hydrogen recycle method2 Jul 2024US 12,024,427 B2National University Corporation Tokai National Higher Education and Research System
- Apparatus for manufacturing a thin film and a method therefor18 Jun 2024US 12,014,922 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Method and apparatus for the continuous vapor deposition of silicon on substrates2 Jan 2024US 11,862,462 B2NexWafe GmbH
- Method for recycling an effluent gas from chemical vapor deposition or infiltration30 Apr 2026US 2026/0117374 A1Safran Landing Systems
- Methods and system for precursor recycling16 Apr 2026US 2026/0103799 A1ASM IP Holding B. V.
- Processing chamber with gas recycling12 Mar 2026US 2026/0071328 A1APPLIED Materials.Inc.
- Source material collection system, substrate processing apparatus, source material collection method and method of manufacturing semiconductor device6 Nov 2025US 2025/0339787 A1Kokusai Electric Corporation
- Process gas recycling29 May 2025US 2025/0171900 A1ASM IP Holding B. V.
Most cited
By later US patents
- Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas571US 6,863,019 B2APPLIED Materials.Inc. · 2005
- Apparatus for atomic layer chemical vapor deposition543US 6,812,157 B12004
- Plasma film forming apparatus422US 8,573,154 B2Honda Motor Co., Ltd. · 2013
- System and method for supplying a precursor for an atomic layer deposition (ALD) process284US 11,053,584 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2021
- Method and apparatus for the deposition of solid films of a material from a jet stream entraining the gaseous phase of said material114US 4,788,082 A1988