System and method for supplying a precursor for an atomic layer deposition (ALD) process

A method for supplying a precursor material for an atomic layer deposition (ALD) process, the method system comprising:

• providing, via a gas supply, one or more precursor materials to a deposition chamber;
• transporting, via a gas circulation system coupled to an output line of the deposition, exhaust gas exiting the deposition chamber to an input line of the deposition chamber;
• reducing, using a filter coupled to the gas circulation system, contaminants in the gas being transported back into the deposition chamber;
• controlling, using a first valve, flow through the bypass line;
• controlling, using a second valve, flow to the filter by closing the first valve and opening the second valve to cause the exhaust gas to flow through the filter;
• producing, using a gas composition detection system coupled to the output line, an output signal indicating a composition of the exhaust gas exiting the deposition chamber;
• controlling, during deposition using a controller coupled to the gas supply, (i) an amount of the one or more precursor materials being provided to the deposition chamber and (ii) and amount of the exhaust gas being transported back to the deposition chamber, based on the output signal of the gas composition detection system, wherein the controller is configured to close the first valve and open the second valve to cause the exhaust gas to flow through the filter based on the output signal of the gas composition detection system indicating filtering is not necessary, and to open the first valve and close the second valve to cause the exhaust gas to bypass the filter based on the output signal of the gas composition detection system indicating filtering is necessary.

A method for supplying a precursor material for an atomic layer deposition (ALD) process, the method comprising:

• providing one or more precursor materials to a deposition chamber;
• monitoring a composition of a gas exiting the deposition chamber;
• transporting the gas exiting the deposition chamber back into the deposition chamber via a circulation system;
• and
• controlling i) the providing of the one or more precursor materials, and ii) the transporting of the gas back into the deposition chamber based on the monitored composition of the gas exiting the deposition chamber.