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US 2025/0171900 A1Published application
Process gas recycling
AssigneeASM IP Holding B.V.
InventorsIvo Johannes Raaijmakers, Eric James Shero, Giuseppe Alessio Verni, Matthew Surman, Michael Eugene Givens, Charles Dezelah
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Abstract
Described herein are systems and methods that may be useful in the context of gas reuse thin film deposition equipment. Embodiments of the present disclosure are particularly related to one or more of separate collection and recycling one or more gasses such as precursors, reactants, and purge gasses.
Claims15
A system comprising:
- a reaction chamber;
- a precursor source comprising a precursor, the precursor source being operationally connected to the reaction chamber by means of a precursor line, the precursor line being disposed with a precursor valve that is operable to open and close the precursor line;
- a reactant source comprising a reactant, the reactant source being operationally connected to the reaction chamber by means of a reactant line, the reactant line being disposed with a reactant valve that is operable to open and close the reactant line;
- a precursor side stream line that is constructed and arranged to remove a precursor side stream from the reaction chamber, the precursor side stream line being disposed with a precursor side stream valve that is operable to open and close the precursor side stream line;
- and
- a reactant side stream line that is constructed and arranged to remove a reactant side stream from the reaction chamber, the reactant side stream line being disposed with a reactant side stream valve that is operable to open and close the reactant side stream line.
3 more elements
Dependencies are inferred from the claim text.