C23C 16/45568
Porous nozzles
Official title: {Porous nozzles}
C23C16/45568 (Porous nozzles) appears on 61 US grants and 72 published applications in this corpus.
Search patents in C23C- Granted patents
- 61
- Published applications
- 72
- Assignees
- 48
- Inventors
- 214
- Latest grant
- 4 Nov 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 2 | 0 |
| 1992 | 2 | 0 |
| 1993 | 0 | 0 |
| 1994 | 2 | 0 |
| 1995 | 2 | 0 |
| 1996 | 2 | 0 |
| 1997 | 2 | 0 |
| 1998 | 3 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 1 |
| 2002 | 0 | 2 |
| 2003 | 1 | 5 |
| 2004 | 3 | 5 |
| 2005 | 1 | 4 |
| 2006 | 3 | 4 |
| 2007 | 1 | 3 |
| 2008 | 1 | 3 |
| 2009 | 2 | 3 |
| 2010 | 2 | 3 |
| 2011 | 1 | 4 |
| 2012 | 2 | 3 |
| 2013 | 1 | 4 |
| 2014 | 4 | 3 |
| 2015 | 4 | 3 |
| 2016 | 2 | 1 |
| 2017 | 2 | 1 |
| 2018 | 2 | 2 |
| 2019 | 0 | 2 |
| 2020 | 4 | 7 |
| 2021 | 3 | 0 |
| 2022 | 1 | 0 |
| 2023 | 2 | 5 |
| 2024 | 0 | 3 |
| 2025 | 2 | 0 |
| 2026 | 0 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Gas diffuser housings, devices, and related methods4 Nov 2025US 12,460,296 B2Entegris, Inc.
- ALD apparatus, method and valve4 Nov 2025US 12,460,297 B2Picosun Oy
- ALD apparatus, method and valve19 Sep 2023US 11,761,082 B2Picosun Oy
- Manufacturing of coated items6 Jun 2023US 11,668,005 B2Picosun Oy
- Gas introduction structure, treatment apparatus, and treatment method8 Mar 2022US 11,270,895 B2Tokyo Electron Limited
- Large scale system for atomic layer deposition13 Aug 2026US 2026/0234803 A1Forge Nano, Inc.
- Macrocell architectural structures for heat exchange in epitaxial growth processing equipment31 Oct 2024US 2024/0360588 A1APPLIED Materials.Inc.
- Fluidic baffle for high pressure fluid distribution and substrate processing apparatus23 May 2024US 2024/0167156 A1Samsung Electronics Co., Ltd.
- Wafer support plate and semiconductor manufacturing apparatus including same29 Feb 2024US 2024/0068100 A1United Semiconductor Japan Co., Ltd.
- Ald apparatus, method and valve30 Nov 2023US 2023/0383404 A1Picosun Oy
Most cited
By later US patents
- CVD apparatus193US 5,676,758 AAnelva Corporation · 1997
- Method for forming diamond-like nanocomposite or doped-diamond-like nanocomposite films120US 5,352,493 A1994
- Diamond-like metallic nanocomposites118US 5,466,431 A1995
- Delivery device comprising gas diffuser for thin film deposition71US 7,789,961 B2Eastman Kodak Company · 2010
- Hot filament chemical vapor deposition reactor68US 5,160,544 ADiamonex, Incorporated · 1992