Gas introduction structure, treatment apparatus, and treatment method
AssigneeTokyo Electron Limited
InventorKatsutoshi Ishii
Life of this patent
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Abstract
A gas introduction structure includes: a gas introduction pipe inserted in a process chamber; and a discharge part covering an end portion of the gas introduction pipe at a side of the process chamber, and configured to discharge a gas supplied to the gas introduction pipe into the process chamber, wherein the discharge part includes a porous portion formed of a porous body, and a dense portion disposed at a location closer to a leading end of the discharge part than the porous portion and having a porosity lower than that of the porous portion.
Claims16
A gas introduction structure comprising:
- a gas introduction pipe inserted in a process chamber;
- and a discharge part covering an end portion of the gas introduction pipe at a side of the process chamber, and configured to discharge a gas supplied to the gas introduction pipe into the process chamber, wherein the discharge part comprises an installed porous portion formed of a porous body, and a dense portion disposed at a location closer to a leading end of the discharge part than the porous portion and having a porosity lower than that of the porous portion, wherein the porous body is formed of a quartz-glass porous body, wherein the dense portion is formed of a densified quartz-glass porous body obtained by sintering the quartz-glass porous body, and wherein, after installing the quartz-glass porous body covering the end portion of the gas introduction pipe, and then sintering a part of a leading end portion of the quartz-glass porous body, whereby a non-sintered part forms the porous portion and a sintered part forms the dense portion.
A treatment apparatus comprising:
- a process chamber;
- and a gas introduction structure configured to introduce a gas into the process chamber, the gas introduction structure including:
- a gas introduction pipe inserted in the process chamber;
- and a discharge part covering an end portion of the gas introduction pipe at a side of the process chamber, and configured to discharge a gas supplied to the gas introduction pipe into the process chamber, wherein the discharge part comprises an installed porous portion formed of a porous body, and a dense portion disposed at a location closer to a leading end of the discharge part than the porous portion and having a porosity lower than that of the porous portion, wherein the porous body is formed of a quartz-glass porous body, wherein the dense portion is formed of a densified quartz-glass porous body obtained by sintering the quartz-glass porous body, and wherein, after installing the quartz-glass porous body covering the end portion of the gas introduction pipe, sintering a part of a leading end portion of the quartz-glass porous body, whereby a non-sintered part forms the porous portion and a sintered part forms the dense portion.
A gas introduction structure comprising:
- a gas introduction pipe inserted in a process chamber;
- and
- a discharge part covering an end portion of the gas introduction pipe at a side of the process chamber, and configured to discharge a gas supplied to the gas introduction pipe into the process chamber,
- wherein the discharge part comprises a porous portion formed of a porous body, and a dense portion disposed at a location closer to a leading end of the discharge part than the porous portion and having a porosity lower than that of the porous portion,
- wherein the porous body is formed of a quartz-glass porous body, and
- wherein the dense portion is formed by welding a quartz bar to an end of the porous portion.
Dependencies are inferred from the claim text.