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US 11,761,082 B2Granted
ALD apparatus, method and valve
AssigneePicosun Oy
InventorMarko Pudas
Life of this patent
Estimating the term…
Abstract
An apparatus, a method and a valve with a reactive chemical inlet, a reaction chamber outlet, and a closure having an open and closed configuration to open and close, respectively, a route from the reactive chemical inlet to the reaction chamber outlet, the valve further including an additional cleaning chemical inlet at a downstream side of the closure to purge the closure.
Claims30
An apparatus, comprising:
- a reaction chamber;
- a pulsing valve directly attached to the reaction chamber, the pulsing valve comprising:
- a reactive chemical inlet;
- a reaction chamber outlet;
- and
- a closure having an open and closed configuration to open and close, respectively, a route from the reactive chemical inlet to the reaction chamber outlet, the apparatus further comprising:
- an additional cleaning chemical inlet at the reaction chamber side of the closure to purge the closure,
- wherein the closure provides a valve output surface facing the reaction chamber outlet in the open configuration,
- wherein the valve output surface is purged in both the open configuration and in the closed configuration of the closure,
- and wherein in the closed configuration, the reactive chemical remains on a side of the closure other than a side of the closure providing the valve output surface.
7 more elements
A method, comprising:
- supplying reactive chemical through a pulsing valve comprising a reactive chemical inlet, a reaction chamber outlet, and a closure having an open and closed configuration to open and close, respectively, a route from the reactive chemical inlet to the reaction chamber outlet, wherein the pulsing valve is directly attached to a reaction chamber;
- controlling the closing of the route by pulsing the closure;
- and
- supplying cleaning chemical through an additional cleaning chemical inlet at the reaction chamber side of the closure and purging the closure by the cleaning chemical,
- purging a valve output surface provided by the closure that is facing the reaction chamber outlet in the open configuration;
- and
- purging the valve output surface in both the open configuration and in the closed configuration of the closure,
- wherein in the closed configuration, the reactive chemical remains on a side of the closure other than a side of the closure providing the valve output surface.
5 more elements
A pulsing valve directly attached to a reaction chamber, the pulsing valve, comprising:
- a reactive chemical inlet;
- a reaction chamber outlet;
- and
- a closure having an open and closed configuration to open and close, respectively, a route from the reactive chemical inlet to the reaction chamber outlet, the valve further comprising:
- an additional cleaning chemical inlet at a downstream side of the closure to purge the closure,
- wherein the closure provides a valve output surface facing the reaction chamber outlet in the open configuration,
- wherein the valve output surface is purged in both the open configuration and in the closed configuration of the closure,
- and wherein in the closed configuration, the reactive chemical remains on a side of the closure other than a side of the closure providing the valve output surface.
5 more elements
Dependencies are inferred from the claim text.