C23C 14/543
Using measurement on the vapor source
Official title: {using measurement on the vapor source}
C23C14/543 (Using measurement on the vapor source) appears on 70 US grants and 123 published applications in this corpus.
Search patents in C23C- Granted patents
- 70
- Published applications
- 123
- Assignees
- 78
- Inventors
- 297
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 2 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 2 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 2 | 2 |
| 2003 | 3 | 2 |
| 2004 | 2 | 3 |
| 2005 | 1 | 2 |
| 2006 | 2 | 5 |
| 2007 | 0 | 2 |
| 2008 | 0 | 4 |
| 2009 | 0 | 3 |
| 2010 | 1 | 1 |
| 2011 | 1 | 3 |
| 2012 | 1 | 4 |
| 2013 | 0 | 2 |
| 2014 | 1 | 4 |
| 2015 | 3 | 5 |
| 2016 | 0 | 5 |
| 2017 | 2 | 4 |
| 2018 | 1 | 7 |
| 2019 | 4 | 13 |
| 2020 | 8 | 9 |
| 2021 | 5 | 7 |
| 2022 | 7 | 9 |
| 2023 | 6 | 10 |
| 2024 | 6 | 5 |
| 2025 | 4 | 6 |
| 2026 | 1 | 6 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method for controlling a flux distribution of evaporated source material, detector for measuring electromagnetic radiation reflected on a source surface and system for thermal evaporation with electromagnetic radiation6 Oct 2026US 12,753,487 B2Max-Planck-Gesellschaft Zur FöRderung Der Wissenschaften E. V.
- Physical vapor deposition chamber with target surface morphology monitor2 Dec 2025US 12,486,566 B2Taiwan Semiconductor Manufacturing Company.Ltd
- System for target arcing mapping and plasma diagnosis9 Sep 2025US 12,412,738 B1APPLIED Materials.Inc.
- Thermal evaporation sources for wide-area deposition29 Apr 2025US 12,286,704 B2JLN Solar, Inc.
- Apparatus for and method of manufacturing semiconductor device18 Mar 2025US 12,252,778 B2Samsung Electronics Co., Ltd.
- Improved css deposition process27 Aug 2026US 2026/0250832 A1Nanofilm Technologies International Limited
- Source arrangement and thermal laser epitaxy system16 Jul 2026US 2026/0201540 A1Max-Planck-Gesellschaft Zur FöRderung Der Wissenschaften E. V.
- Method of using a tle system and tle system25 Jun 2026US 2026/0176740 A1Max-Planck-Gesellschaft Zur FöRderung Der Wissenschaften E. V.
- Laser system and evaporation system4 Jun 2026US 2026/0152843 A1Max-Planck-Gesellschaft Zur FöRderung Der Wissenschaften E. V.
- System for target arcing mapping and plasma diagnosis30 Apr 2026US 2026/0121005 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Film forming apparatus427US 9,127,358 B2Tokyo Electron Limited · 2015
- Feedback control for vacuum deposition apparatus41US 4,166,784 AApplied Films Lab, Inc. · 1979
- Sputtering method and apparatus20US 4,902,394 AHitachi, Ltd. · 1990
- Temperature sensor assembly17US 4,426,569 AThe Perkin-Elmer Corporation · 1984
- Method and system using power modulation for maskless vapor deposition of spatially graded thin film and multilayer coatings with atomic-level precision and accuracy15US 6,425,988 B12002