Apparatus for and method of manufacturing semiconductor device

A method of manufacturing a semiconductor device, the method comprising:

• heating an organic source in an evaporator to provide a source gas on a substrate;
• pumping the source gas, a derived molecule produced from the organic source, and air through an exhaust line connected to a chamber using a low vacuum pump and a high vacuum pump having a pumping pressure that is greater than that of the low vacuum pump;
• using an analyzer to detect the derived molecule, the analyzer being connected to the exhaust line;
• and
• determining whether or not a partial pressure of the derived molecule is equal has increased to a reference partial pressure,
• wherein the exhaust line comprises:
• a roughing line connecting the low vacuum pump to the chamber, bypassing the high vacuum pump, and having a roughing valve;
• and
• a foreline branched from the roughing line between the low vacuum pump and the roughing valve, connecting the high vacuum pump and the low vacuum pump to the chamber sequentially, and having a first foreline valve between the high vacuum pump and the low vacuum pump, and
• wherein the foreline comprises:
• a first foreline connecting the high vacuum pump to the chamber, having a second foreline valve between the chamber and the high vacuum pump;
• and
• a second foreline branched from the first foreline between the second foreline valve and the high vacuum pump, connected to the chamber, and having a third foreline valve, and
• wherein the analyzer is connected to the second foreline between the third foreline valve and the chamber.