Method of using a tle system and tle system

Method of using a thermal laser evaporation system, the TLE system comprising a reaction chamber fillable with a reaction atmosphere, a substrate arranged in the reaction chamber, one or more sources arranged in the reaction chamber, each source comprising a source element consisting of a source material, and a laser source for providing a laser beam impinging on the source element and thereby evaporating or sublimating the source material for providing a flux of evaporated or sublimated source material for a deposition onto the substrate,

• the method comprising the steps of
• a) Determining a desired flux of source material evaporated and/or sublimated source material by the laser beam,
• b) Determining a nominal heat energy stored in the source element corresponding to the desired flux,
• c) Determining a nominal intensity of the laser beam corresponding to the desired flux when the source element stores the nominal heat energy,
• d) Determining an actual heat energy stored in the source element,
• e) Determining a working intensity of the laser beam in dependence of a deviation of the actual heat energy from the nominal heat energy, wherein
• the working intensity is higher than the nominal intensity if the actual heat energy is smaller than the nominal heat energy, and
• the working intensity is smaller than the nominal intensity if the actual heat energy is higher than the nominal heat energy, and
• f) Providing the laser beam with the working intensity.

Thermal laser evaporation system, the TLE system comprising a reaction chamber fillable with a reaction atmosphere, a substrate arranged in the reaction chamber, one or more sources arranged in the reaction chamber, each source comprising a source element consisting of a source material, and a laser source for providing a laser beam impinging on the source element and thereby evaporating or sublimating the source material for providing a flux of evaporated or sublimated source material for a deposition onto the substrate,

• wherein the TLE system is constructed to carry out a method of using the thermal laser evaporation system, the TLE system comprising a reaction chamber fillable with a reaction atmosphere, a substrate arranged in the reaction chamber, one or more sources arranged in the reaction chamber, each source comprising a source element consisting of a source material, and a laser source for providing a laser beam impinging on the source element and thereby evaporating or sublimating the source material for providing a flux of evaporated or sublimated source material for a deposition onto the substrate,
• the method comprising the steps of
• a) Determining a desired flux of source material evaporated and/or sublimated source material by the laser beam,
• b) Determining a nominal heat energy stored in the source element corresponding to the desired flux,
• c) Determining a nominal intensity of the laser beam corresponding to the desired flux when the source element stores the nominal heat energy,
• d) Determining an actual heat energy stored in the source element,
• e) Determining a working intensity of the laser beam in dependence of a deviation of the actual heat energy from the nominal heat energy, wherein
• the working intensity is higher than the nominal intensity if the actual heat energy is smaller than the nominal heat energy, and
• the working intensity is smaller than the nominal intensity if the actual heat energy is higher than the nominal heat energy, and
• f) Providing the laser beam with the working intensity.