System for target arcing mapping and plasma diagnosis
AssigneeApplied Materials, Inc.
InventorsJunjie Pan, Xiangjin Xie, Fuhong Zhang
Life of this patent
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Abstract
Methods of monitoring arcing in a process chamber, processing chambers and monitoring apparatus are described. At least one of the angular or radial position of a magnetron is determined in the chamber relative to a reference location on a surface of the substrate using positional information from one or more motors. An arcing profile is generated comprising a plurality of arcing states measured based at least on the determined angular and/or radial position of the magnetron.
Claims20
A method of monitoring arcing in a process chamber, the method comprising:
- determining at least an angular position of a magnetron in the process chamber relative to a reference location on a surface of a substrate using positional information of a motor used to position the magnetron;
- and
- generating an arcing profile comprising a plurality of arcing states measured based at least on the determined angular position of the magnetron.
An apparatus for monitoring arcing within a process chamber including a moveable magnetron and at least one power supply, the apparatus comprising:
- a processor;
- and
- a memory coupled to the processor, the memory having stored therein instructions executable by the processor to configure the apparatus to:
- determine at least an angular position of a magnetron in the process chamber relative to a reference location on a surface of a substrate using positional information of a motor used to position the magnetron;
- and
- generate an arcing profile comprising a plurality of arcing states measured based at least on the determined angular position of the magnetron.
A substrate processing system comprising:
- a process chamber, comprising;
- an inner volume;
- a substrate support disposed within the inner volume to support a substrate;
- a movable magnetron configured to be disposed proximate a back side of a target opposite a front face of the target and rotatable about a central axis of the substrate support;
- and
- at least one power supply providing power to the process chamber;
- and
- a controller comprising a processor and a memory coupled to the processor, the memory having stored therein instructions executable by the processor to configure the controller to:
- determine at least an angular position of the movable magnetron in the process chamber relative to a reference location on a surface of the substrate using positional information of a motor used to position the magnetron;
- and
- generate an arcing profile comprising a plurality of arcing states measured based at least on the determined angular position of the magnetron.
Dependencies are inferred from the claim text.