C11D 7/3227
Ethers thereof
Official title: {Ethers thereof}
C11D7/3227 (Ethers thereof) appears on 118 US grants and 72 published applications in this corpus.
Search patents in C11D- Granted patents
- 118
- Published applications
- 72
- Assignees
- 57
- Inventors
- 197
- Latest grant
- 25 Nov 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 3 | 0 |
| 1993 | 4 | 0 |
| 1994 | 3 | 0 |
| 1995 | 9 | 0 |
| 1996 | 3 | 0 |
| 1997 | 7 | 0 |
| 1998 | 2 | 0 |
| 1999 | 7 | 0 |
| 2000 | 11 | 0 |
| 2001 | 13 | 2 |
| 2002 | 7 | 13 |
| 2003 | 5 | 4 |
| 2004 | 2 | 9 |
| 2005 | 0 | 6 |
| 2006 | 6 | 4 |
| 2007 | 5 | 2 |
| 2008 | 3 | 2 |
| 2009 | 2 | 4 |
| 2010 | 2 | 3 |
| 2011 | 3 | 1 |
| 2012 | 2 | 1 |
| 2013 | 2 | 2 |
| 2014 | 0 | 1 |
| 2015 | 2 | 1 |
| 2016 | 1 | 0 |
| 2017 | 1 | 1 |
| 2018 | 0 | 1 |
| 2019 | 2 | 5 |
| 2020 | 0 | 0 |
| 2021 | 2 | 1 |
| 2022 | 2 | 2 |
| 2023 | 0 | 1 |
| 2024 | 1 | 3 |
| 2025 | 4 | 3 |
By publication year. Applications have been published since 2001.
Recent patents
- Treatment liquid, method for washing substrate, and method for removing resist25 Nov 2025US 12,481,218 B2FUJIFILM Corporation
- Treatment liquid and substrate washing method14 Oct 2025US 12,441,965 B2FUJIFILM Corporation
- Composition comprising three alkanolamines and a hydroxylamine for removing etch residues13 May 2025US 12,298,669 B2Versum Materials US, LLC
- Smectite clay-based fabric softener compositions with etheramine stabilizers4 Feb 2025US 12,215,302 B1
- Treatment liquid, method for washing substrate, and method for removing resist13 Feb 2024US 11,899,369 B2FUJIFILM Corporation
- Composition for post-cmp cleaning4 Sep 2025US 2025/0277171 A1Entegris, Inc.
- Stripper composition and method for forming pattern using the same8 May 2025US 2025/0147425 A1Enf Technology Co., Ltd.
- Composition, manufacturing method for semiconductor element, and cleaning method for semiconductor substrate16 Jan 2025US 2025/0017209 A1FUJIFILM Corporation
- Treatment liquid, method for washing substrate, and method for removing resist11 Jul 2024US 2024/0231237 A9FUJIFILM Corporation
- Hydrophilic polyether amine solution and uses thereof20 Jun 2024US 2024/0200490 A1Huntsman Petrochemical Corporation
Most cited
By later US patents
- Compact cleaner containing surfactants167US 6,331,518 B2Henkel-Ecolab GmbH & Co. OHG · 2001
- Cleaning compositions for removing etching residue and method of using150US 5,334,332 AEKC Technology, Inc. · 1994
- Post clean treatment composition comprising an organic acid and hydroxylamine137US 5,981,454 AEKC Technology, Inc. · 1999
- Method for cleaning a gate stack122US 7,396,773 B1Cypress Semiconductor Corporation · 2008
- Antimicrobial acid cleaner for use on organic or food soil91US 5,998,358 AEcolab Inc. · 1999