US 2025/0147425 A1 · STRIPPER COMPOSITION AND METHOD FOR FORMING PATTERN USING THE SAME

Abstract

Provided is a stripper composition and a method for forming a pattern using the same. The stripper composition includes, in set content ranges, an amine compound, a glycol compound, an aprotic polar solvent excluding N-methyl-2-pyrrolidone and N-methylformamide, and a first corrosion inhibitor represented by Formula 1. The stripper composition according to an embodiment may be used in a process of removing a photoresist pattern formed on a lower film, and may supply characteristics of an excellent stripping power for photoresist and prevention or reduction of damage of the lower film.

Claims20

Dependent claims

A stripper composition comprising:

with respect to a total weight of the stripper composition,
an amine compound of about 1% by weight to about 30% by weight;
a glycol compound of about 5% by weight to about 60% by weight;
an aprotic polar solvent, excluding N-methyl-2-pyrrolidone and N-methylformamide, of about 20% by weight to about 70% by weight;
and
a first corrosion inhibitor, represented by Formula 1, of about 0.001% by weight to about 20% by weight:
in Formula 1, n is an integer of 1 to 6.

4 more elements

Dependencies are inferred from the claim text.

Stripper composition and method for forming pattern using the same

Life of this patent

Stripper composition and method for forming pattern using the same

Life of this patent

Abstract

Claims20