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US 12,298,669 B2Granted
Composition comprising three alkanolamines and a hydroxylamine for removing etch residues
AssigneeVersum Materials US, LLC
InventorsLaisheng Sun, Lili Wang, Aiping Wu, Yi-Chia Lee, Tianniu Chen
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Abstract
A method and cleaning composition for microelectronic devices or semiconductor substrates including at least one alkanolamine; at least one hydroxylamine or derivatives of hydroxylamine or mixtures thereof; at least one polyfunctional organic acid with at least two carboxylic acid groups and water. The cleaning compositions can further include at least one corrosion inhibitor.
Claims11
A composition for cleaning microelectronic devices or semiconductor substrates consisting of:
- (i) at least three alkanolamines;
- (ii) at least one of hydroxylamine or hydroxylamine sulfate;
- (iii) citric acid;
- (iv) water;
- and
- (v) optionally one or more corrosion inhibitor selected from the group consisting of catechol and gallic acid.
3 more elements
Dependencies are inferred from the claim text.