Composition, manufacturing method for semiconductor element, and cleaning method for semiconductor substrate

Abstract

The present invention provides a composition that suppresses the occurrence of defects in an object to be applied, even in a case of being used after a predetermined period of time has elapsed from the production. In addition, the present invention provides a manufacturing method for a semiconductor element and a cleaning method for a semiconductor substrate. The composition according to the present invention is a composition containing an antibacterial agent, an organic acid, an organic amine, and water, in which a content of the water is 70% by mass or more with respect to a total mass of the composition, and a pH at 25° C. is 4.0 to 9.0.

Dependencies are inferred from the claim text.