C11D 3/3445
Containing sulfino groups
Official title: {containing sulfino groups, e.g. dimethyl sulfoxide}
C11D3/3445 (Containing sulfino groups) appears on 45 US grants and 39 published applications in this corpus.
Search patents in C11D- Granted patents
- 45
- Published applications
- 39
- Assignees
- 35
- Inventors
- 108
- Latest grant
- 13 Jan 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 11 | 0 |
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 2 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 0 |
| 2002 | 0 | 1 |
| 2003 | 1 | 1 |
| 2004 | 0 | 0 |
| 2005 | 0 | 1 |
| 2006 | 0 | 0 |
| 2007 | 1 | 2 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 1 |
| 2012 | 0 | 2 |
| 2013 | 0 | 3 |
| 2014 | 0 | 1 |
| 2015 | 5 | 3 |
| 2016 | 1 | 1 |
| 2017 | 0 | 1 |
| 2018 | 1 | 4 |
| 2019 | 1 | 3 |
| 2020 | 1 | 2 |
| 2021 | 4 | 5 |
| 2022 | 0 | 4 |
| 2023 | 4 | 3 |
| 2024 | 3 | 0 |
| 2025 | 3 | 0 |
| 2026 | 1 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Process solution for polymer processing13 Jan 2026US 12,525,445 B2Dongwoo Fine-Chem Co., Ltd.
- Photoresist remover10 Jun 2025US 12,325,844 B2Versum Materials US, LLC
- Composition for removing polymer8 Apr 2025US 12,269,788 B2Dongwoo Fine-Chem Co., Ltd.
- Decomposing/cleaning composition, method for cleaning adhesive polymer, and method for producing device wafer11 Feb 2025US 12,221,595 B2Resonac Corporation
- Composition and method for removing a coating from a surface3 Dec 2024US 12,157,833 B2University of Massachusetts
- Microelectronic device cleaning composition12 Mar 2026US 2026/0071149 A1Entegris, Inc.
- Solvent Composition and Process for Removal of Asphalt and Other Contaminant Materials2 Nov 2023US 2023/0348824 A1United Laboratories International, LLC
- Composition for Removing Polymer26 Oct 2023US 2023/0339843 A1Dongwoo Fine-Chem Co., Ltd.
- Microelectronic device cleaning composition25 May 2023US 2023/0159866 A1Entegris, Inc.
- Photoresist Remover20 Oct 2022US 2022/0333044 A1Versum Materials US, LLC
Most cited
By later US patents
- Monoesters derived from ethoxylated higher alcohols and thiodisuccinic acid as detergent builders22US 3,976,586 AGAF Corporation · 1976
- Organic stripping composition21US 5,753,601 AAshland Inc. · 1998
- Aqueous stripping and cleaning compositions21US 5,988,186 AAshland Inc. · 1999
- Photoresist stripping composition13US 6,211,127 B1Samsung Electronics Co., Ltd. · 2001
- Photoresist and post etch residue cleaning solution10US 8,987,181 B2Dynaloy, LLC · 2015