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US 2022/0333044 A1Published application
Photoresist Remover
AssigneeVersum Materials US, LLC
InventorsYUANMEI CAO, MICHAEL PHENIS, LILI WANG, LAISHENG SUN, AIPING WU
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Abstract
Cleaning compositions and the method of using the same are disclosed, where the compositions include one or more alkanolamines, one or more ether alcohol solvents or aromatic containing alcohol, one or more corrosion inhibitors, and optionally one or more secondary solvents.
Claims35
A cleaning composition comprising:
- (i) one or more alkanolamines,
- (ii) one or more ether alcohol solvents or aromatic containing alcohol, and
- (iii) one or more corrosion inhibitors.
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Dependencies are inferred from the claim text.