Organic stripping composition
AssigneeAshland Inc.
InventorsIrl E. Ward, Francis W. Michelotti
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Abstract
Organic stripping composition for photoresists comprising organic polar solvents and basic amines which includes an inhibitor which forms a coordination complex with a metal.
Claims1
In a process of stripping comprising the steps of applying an aqueous stripping composition consisting of organic polar solvent and a basic amine to a substrate having a photoresist coating and organic and/or inorganic residues and removing said stripping composition, said photoresist coating, and said residues from said substrate, the improvement wherein said composition has a pH of at least 11 and is an admixture which further consists of an effective inhibiting amount of pyrogallol.
Dependencies are inferred from the claim text.