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US 12,325,844 B2Granted
Photoresist remover
AssigneeVersum Materials US, LLC
InventorsYuanmei Cao, Michael Phenis, Lili Wang, Laisheng Sun, Aiping Wu
Life of this patent
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Abstract
Cleaning compositions and the method of using the same are disclosed, where the compositions include one or more alkanolamines, one or more ether alcohol solvents or aromatic containing alcohol, one or more corrosion inhibitors, and optionally one or more secondary solvents.
Claims18
A cleaning composition comprising:
- (i) about 10 wt % to about 30 wt % of one or more alkanolamines comprising monoethanolamine,
- (ii) about 50 wt % to about 90 wt % of one or more ether alcohol solvents or aromatic containing alcohol comprising diethylene glycol monobutyl ether, and
- (iii) about 0.25 wt % to about 2 wt % of a mixture of two or more corrosion inhibitors consisting of (i) a first corrosion inhibitor comprising a copper salt and (ii) a second corrosion inhibitor selected from the group consisting of sebacic acid, catechol, resorcinol, glycerol, sorbitol and 8-hydroxyquinoline,
- wherein the composition comprises less than about 0.1 wt % of water and is free of quaternary ammonium compounds and DMSO.
1 more element
Dependencies are inferred from the claim text.