C08F 12/22
Oxygen
C08F12/22 (Oxygen) appears on 362 US grants and 427 published applications in this corpus.
Search patents in C08F- Granted patents
- 362
- Published applications
- 427
- Assignees
- 181
- Inventors
- 957
- Latest grant
- 23 Jun 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 3 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 2 | 0 |
| 1981 | 2 | 0 |
| 1982 | 2 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 3 | 0 |
| 1986 | 1 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 5 | 0 |
| 1991 | 2 | 0 |
| 1992 | 6 | 0 |
| 1993 | 5 | 0 |
| 1994 | 2 | 0 |
| 1995 | 4 | 0 |
| 1996 | 3 | 0 |
| 1997 | 0 | 0 |
| 1998 | 3 | 0 |
| 1999 | 4 | 0 |
| 2000 | 1 | 0 |
| 2001 | 4 | 0 |
| 2002 | 1 | 0 |
| 2003 | 2 | 2 |
| 2004 | 0 | 4 |
| 2005 | 1 | 7 |
| 2006 | 3 | 8 |
| 2007 | 2 | 8 |
| 2008 | 7 | 12 |
| 2009 | 5 | 9 |
| 2010 | 3 | 17 |
| 2011 | 10 | 14 |
| 2012 | 9 | 20 |
| 2013 | 15 | 29 |
| 2014 | 21 | 21 |
| 2015 | 26 | 32 |
| 2016 | 26 | 43 |
| 2017 | 26 | 41 |
| 2018 | 29 | 36 |
| 2019 | 37 | 17 |
| 2020 | 25 | 15 |
| 2021 | 16 | 15 |
| 2022 | 9 | 10 |
| 2023 | 16 | 16 |
| 2024 | 9 | 15 |
| 2025 | 6 | 18 |
| 2026 | 2 | 18 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- High purity 4-hydroxystyrene solution, method of producing the same, and method of producing 4-hydroxystyrene polymer23 Jun 2026US 12,662,443 B2Maruzen Petrochemical Co., Ltd.
- Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device5 May 2026US 12,619,147 B2FUJIFILM Corporation
- Compound, resin precursor, cured object, optical element, optical system, interchangeable camera lens, optical device, cemented lens, and method for manufacturing cemented lens9 Dec 2025US 12,492,273 B2Nikon Corporation
- Polymers and the use thereof for detecting ion fluxes4 Nov 2025US 12,460,038 B2Centre National De La Recherche Scientifique
- Molded product comprising polarized olefin-based polymer and property thereof6 May 2025US 12,291,585 B2Riken
- Positive resist for dry development, method for manufacturing semiconductor devices using the same and multilayered structure formed using the same24 Sep 2026US 2026/0288000 A1Inha University Research and Business Foundation
- Method for producing compound, polymer, composition, and pattern formation method23 Jul 2026US 2026/0209160 A1Mitsubishi Gas Chemical Company, Inc.
- Methods of forming a semiconductor device23 Jul 2026US 2026/0215233 A1
- Photosensitive resin composition, resin film having pattern and method for producing same, and semiconductor circuit board16 Jul 2026US 2026/0202742 A1Jsr Corporation
- Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for producing electronic device9 Jul 2026US 2026/0194813 A1FUJIFILM Corporation
Most cited
By later US patents
- Process for preparing oligonucleotides103US 7,476,709 B2Avecia Biotechnology Inc. · 2009
- Photoresist compositions containing t-substituted organomethyl vinylaryl ether materials94US 4,603,101 AGeneral Electric Company · 1986
- Polymer for use as protective layers and other components in electrochemical cells50US 10,020,512 B2BASF SE · 2018
- Light absorbing polymers30US 5,981,145 AClariant Finance (BVI) Limited · 1999
- Photoresist material based on polystyrenes29US 5,324,804 ACiba-Geigy Corporation · 1994