C08F 12/24
Phenols or alcohols
C08F12/24 (Phenols or alcohols) appears on 161 US grants and 194 published applications in this corpus.
Search patents in C08F- Granted patents
- 161
- Published applications
- 194
- Assignees
- 72
- Inventors
- 423
- Latest grant
- 5 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 2 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 2 | 0 |
| 1994 | 0 | 0 |
| 1995 | 3 | 0 |
| 1996 | 2 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 2 | 0 |
| 2000 | 1 | 0 |
| 2001 | 1 | 0 |
| 2002 | 0 | 0 |
| 2003 | 1 | 1 |
| 2004 | 0 | 2 |
| 2005 | 1 | 3 |
| 2006 | 1 | 3 |
| 2007 | 0 | 3 |
| 2008 | 2 | 3 |
| 2009 | 1 | 2 |
| 2010 | 0 | 12 |
| 2011 | 4 | 5 |
| 2012 | 7 | 10 |
| 2013 | 8 | 14 |
| 2014 | 12 | 11 |
| 2015 | 11 | 18 |
| 2016 | 15 | 10 |
| 2017 | 13 | 19 |
| 2018 | 11 | 23 |
| 2019 | 14 | 6 |
| 2020 | 15 | 6 |
| 2021 | 9 | 7 |
| 2022 | 2 | 4 |
| 2023 | 9 | 7 |
| 2024 | 4 | 7 |
| 2025 | 2 | 10 |
| 2026 | 1 | 8 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device5 May 2026US 12,619,147 B2FUJIFILM Corporation
- Catechol-containing material for use in dental applications15 Apr 2025US 12,274,763 B2Mussel Polymers, Inc
- Large scale production of catechol-containing polymers8 Apr 2025US 12,269,908 B2Purdue Research Foundation
- Thin-film catechol containing materials22 Oct 2024US 12,122,858 B2Mussel Polymers, Inc
- Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device9 Jul 2024US 12,032,290 B2FUJIFILM Corporation
- Positive resist for dry development, method for manufacturing semiconductor devices using the same and multilayered structure formed using the same24 Sep 2026US 2026/0288000 A1Inha University Research and Business Foundation
- Method for producing compound, polymer, composition, and pattern formation method23 Jul 2026US 2026/0209160 A1Mitsubishi Gas Chemical Company, Inc.
- Methods of forming a semiconductor device23 Jul 2026US 2026/0215233 A1
- Composition and method for manufacturing semiconductor substrate19 Mar 2026US 2026/0079401 A1Jsr Corporation
- Sulfonium salt type monomer, sulfonium salt type quencher, polymer, chemically amplified resist composition, and pattern forming method19 Feb 2026US 2026/0049169 A1Shin-Etsu Chemical Co., Ltd.
Most cited
By later US patents
- Light absorbing polymers30US 5,981,145 AClariant Finance (BVI) Limited · 1999
- Process of producing alkenylphenol polymers23US 4,032,513 AMaruzen Oil Co., Ltd. · 1977
- Method of forming high-temperature resistant polymers20US 5,141,970 ALoctite (Ireland) Limited · 1992
- Phosphorus-containing compositions and their use in hydrocyanation, isomerization and hydroformylation reactions15US 6,924,345 B2Invista North America S A R L · 2005
- Anti-oxidant macromonomers and polymers and methods of making and using the same15US 7,923,587 B2Polnox Corporation · 2011