Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

An actinic ray-sensitive or radiation-sensitive resin composition comprising:

• a resin P having a repeating unit represented by General Formula (P1);
• and
• a photoacid generator Aw,
• wherein the photoacid generator Aw is a compound that generates an acid having a pKa of −1.40 or more upon irradiation with actinic rays or radiation,
• the acid having a pKa of −1.40 or more is a sulfonic acid represented by any of General Formulae (Aw-1), (Aw-2), and (I) to (V),
• in General Formula (P1),
• Mp represents a single bond or a divalent linking group,
• Lp represents a divalent linking group,
• Xp represents O, S, or NRN1, RN1 represents a hydrogen atom or a monovalent organic group, and
• Rp represents a monovalent organic group,
• in General Formula (Aw-1), R11W represents a hydrogen atom or a monovalent organic group, R12W represents a monovalent organic group, and Rf1W represents a fluorine atom or a monovalent organic group including a fluorine atom,
• in General Formula (Aw-2), R21W, R22W, and R23W each independently represent a hydrogen atom, a fluorine atom, or a monovalent organic group, R24W represents a monovalent organic group, and Rf2W represents a fluorine atom or a monovalent organic group including a fluorine atom,
• in General Formula (I), R11 and R12 each independently represent a monovalent organic group, R13 represents a hydrogen atom or a monovalent organic group, L1 represents a group represented by —CO—O—, —CO—, —O—, —S—, —O—CO—, —S—CO—, or —CO—S—, and two selected from R11, R12 and R13 may be bonded to each other to form a ring,
• in General Formula (II), R21 and R22 each independently represent a monovalent organic group, R23 represents a hydrogen atom or a monovalent organic group, L2 represents a group represented by —CO—, —O—, —S—, —O—CO—, —S—CO—, or —CO—S—, and two selected from R21, R22, and R23 may be bonded to each other to form a ring,
• in General Formula (III), R31 and R33 each independently represent a hydrogen atom or a monovalent organic group, and R31 and R33 may be bonded to each other to form a ring,
• in General Formula (IV), R41 and R43 each independently represent a hydrogen atom or a monovalent organic group, and R41 and R43 may be bonded to each other to form a ring, and
• in General Formula (V), R51, R52, and R53 each independently represent a hydrogen atom or a monovalent organic group, and two selected from R51, R52, and R53 may be bonded to each other to form a ring.