B81C 2201/0112
Bosch process
B81C2201/0112 (Bosch process) appears on 89 US grants and 98 published applications in this corpus.
Search patents in B81C- Granted patents
- 89
- Published applications
- 98
- Assignees
- 57
- Inventors
- 237
- Latest grant
- 30 Dec 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 3 | 0 |
| 1999 | 0 | 0 |
| 2000 | 2 | 0 |
| 2001 | 2 | 0 |
| 2002 | 1 | 0 |
| 2003 | 0 | 1 |
| 2004 | 4 | 5 |
| 2005 | 1 | 3 |
| 2006 | 2 | 3 |
| 2007 | 1 | 0 |
| 2008 | 1 | 1 |
| 2009 | 2 | 2 |
| 2010 | 1 | 3 |
| 2011 | 1 | 3 |
| 2012 | 2 | 3 |
| 2013 | 1 | 3 |
| 2014 | 5 | 3 |
| 2015 | 6 | 7 |
| 2016 | 5 | 7 |
| 2017 | 9 | 7 |
| 2018 | 2 | 2 |
| 2019 | 7 | 9 |
| 2020 | 4 | 11 |
| 2021 | 11 | 7 |
| 2022 | 4 | 3 |
| 2023 | 4 | 1 |
| 2024 | 2 | 8 |
| 2025 | 5 | 4 |
| 2026 | 0 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Mirror device manufacturing method and mirror unit manufacturing method30 Dec 2025US 12,509,347 B2Hamamatsu Photonics K.K.
- Etching method11 Nov 2025US 12,469,711 B2Ulvac, Inc.
- Method of manufacturing mirror device5 Aug 2025US 12,378,111 B2Hamamatsu Photonics K.K.
- Method for manufacturing mirror device1 Apr 2025US 12,264,065 B2Hamamatsu Photonics K.K.
- Method for manufacturing semiconductor substrate, method for manufacturing damascene wiring structure, semiconductor substrate, and damascene wiring structure7 Jan 2025US 12,187,607 B2Hamamatsu Photonics K.K.
- MEMS with Reduced Acoustic Impedance6 Aug 2026US 2026/0230743 A1Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V.
- Method of manufacturing a layered structure for a mems apparatus and mems apparatus having such a layered structure26 Feb 2026US 2026/0054980 A1OQmented GmbH
- Method for manufacturing silicon balance springs4 Dec 2025US 2025/0370350 A1Sercalo Microtechnology Limited
- Drive element and optical deflection element13 Nov 2025US 2025/0346481 A1Panasonic Intellectual Property Management Co., Ltd.
- Mems devices singulated by plasma etch16 Oct 2025US 2025/0320115 A1
Most cited
By later US patents
- Method of anisotropically etching silicon679US 5,501,893 ARobert Bosch GmbH · 1996
- Microstructures and single mask, single-crystal process for fabrication thereof160US 5,719,073 ACornell Research Foundation, Inc. · 1998
- Electrically isolated released microstructures133US 5,847,454 ACornell Research Foundcatton, Inc. · 1998
- Microstructure and single mask, single-crystal process for fabrication thereof117US 5,846,849 ACornell Research Foundation, Inc. · 1998
- Microstructures and single mask, single-crystal process for fabrication thereof102US 6,051,866 ACornell Research Foundation, Inc. · 2000