B01D 2258/0216
From cvd treatment or semi-conductor manufacturing
Official title: from CVD treatment or semi-conductor manufacturing
B01D2258/0216 (From cvd treatment or semi-conductor manufacturing) appears on 479 US grants and 654 published applications in this corpus.
Search patents in B01D- Granted patents
- 479
- Published applications
- 654
- Assignees
- 262
- Inventors
- 1,323
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 2 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 2 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 2 | 0 |
| 1998 | 9 | 0 |
| 1999 | 10 | 0 |
| 2000 | 16 | 0 |
| 2001 | 9 | 4 |
| 2002 | 18 | 17 |
| 2003 | 16 | 14 |
| 2004 | 14 | 21 |
| 2005 | 9 | 33 |
| 2006 | 10 | 19 |
| 2007 | 11 | 31 |
| 2008 | 12 | 22 |
| 2009 | 11 | 38 |
| 2010 | 22 | 34 |
| 2011 | 17 | 20 |
| 2012 | 16 | 20 |
| 2013 | 23 | 27 |
| 2014 | 16 | 21 |
| 2015 | 14 | 21 |
| 2016 | 21 | 21 |
| 2017 | 19 | 21 |
| 2018 | 21 | 29 |
| 2019 | 16 | 28 |
| 2020 | 23 | 27 |
| 2021 | 18 | 17 |
| 2022 | 14 | 32 |
| 2023 | 22 | 37 |
| 2024 | 26 | 34 |
| 2025 | 19 | 34 |
| 2026 | 14 | 32 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Exhaust system and exhaust method using buffer29 Sep 2026US 12,746,501 B2Samsung Electronics Co., Ltd.
- Modular abatement apparatus1 Sep 2026US 12,723,755 B2Edwards Limited
- Semiconductor waste gas treatment system and moisture-gas separator of the same21 Jul 2026US 12,685,957 B2Highlight Tech Corp.
- High efficiency trap for particle collection in a vacuum foreline21 Jul 2026US 12,689,010 B2APPLIED Materials.Inc.
- Apparatus for collecting powder in exhaust gas with an increased collection capacity and exhaust gas treatment equipment provided with same2 Jun 2026US 12,643,064 B2Kabushiki Kaisha CSK
- Abatement of effluent containing ammonium chloride8 Oct 2026US 2026/0307006 A1APPLIED Materials.Inc.
- Collecting apparatus and collecting method1 Oct 2026US 2026/0297739 A1Jusung Engineering Co., Ltd.
- System for processing gas and method for processing gas using the same17 Sep 2026US 2026/0273460 A1Research & Business Foundation Sungkyunkwan University
- Reduction of nox emissions from semiconductor process tools17 Sep 2026US 2026/0273463 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Exhaust gas treatment apparatus and exhaust gas treatment method17 Sep 2026US 2026/0273464 A1Ebara Corporation
Most cited
By later US patents
- Abatement of effluent from chemical vapor deposition processes using ligand exchange resistant metal-organic precursor solutions401US 6,500,487 B1Advanced Technology Materials, Inc. · 2002
- Abatement of effluents from chemical vapor deposition processes using organometallic source reagents392US 6,749,671 B2Advanced Technology Materials, Inc. · 2004
- Vapor deposition systems and methods389US 8,202,575 B2Cambridge NanoTech Inc. · 2012
- Method of and apparatus for purifying reduced pressure process chambers388US 6,135,460 ATexas Instruments Incorporated · 2000
- Abatement of effluent from chemical vapor deposition processes using ligand exchange resistant metal-organic precursor solutions386US 6,833,024 B2Adanced Technology Materials, Inc. · 2004