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US 2026/0307006 A1Published application
Abatement of effluent containing ammonium chloride
AssigneeApplied Materials, Inc.
InventorsSue-Ann Yow, Andrew Nguyen
Life of this patent
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AssigneeApplied Materials, Inc.
InventorsSue-Ann Yow, Andrew Nguyen
Estimating the term…
An effluent abatement system includes an exhaust pump connected to a semiconductor device processing apparatus, an abatement foreline connecting the exhaust pump to an abatement apparatus, the abatement foreline having an interior surface and an overall length extending between the exhaust pump and the abatement apparatus, the abatement apparatus comprising a combustor and an abatement foreline connector having an interior surface and disposed between and connecting the abatement foreline and the combustor. The system includes a trace heater along the overall length of the abatement foreline and a polytetrafluoroethylene (PTFE) coating on the interior surface of the abatement foreline for a portion of the overall length of the abatement foreline leading into the abatement foreline connector. Methods of abating effluent including ammonium chloride vapor include utilizing the system.
An effluent abatement system configured to abate effluent containing ammonium chloride gas comprising:
A method of preventing an effluent abatement system from clogging during the abatement of gases emanating from a semiconductor device processing chamber and containing ammonium chloride vapor, the method comprising:
Dependencies are inferred from the claim text.