High efficiency trap for particle collection in a vacuum foreline
AssigneeApplied Materials, Inc.
InventorsJames L'Heureux, Ryan Thomas Downey
Life of this patent
Estimating the term…
Abstract
Embodiments disclosed herein include a particle collection trap for an abatement system for abating compounds produced in semiconductor processes. The particle collection trap includes a device for producing spiral gas flow in the particle collection trap. The spiral gas flow causes particles, which are heavier than the gas, to travel to the outside diameter of the flow path where the gas velocity is slower and to drop out of the gas stream. The device may be a spiral member coupled to a hollow tube or a rolled member having an inner portion coupled to a hollow tube. The particle collection trap increases the accumulation rate of particles in the gas stream without reducing the velocity of the gas flow.
Claims18
A particle collection trap, comprising:
- a body comprising a side wall, a first end, and a second end opposite the first end;
- a hollow tube disposed in the body, the hollow tube extending from an opening to an interior of the body through the first end of the body and terminating in direct contact with the second end of the body, the hollow tube having one or more openings being formed in the hollow tube at the second end;
- an inlet port at the first end open to an interior of the hollow tube;
- a rolled member disposed in the body around the hollow tube, the rolled member having a top, a bottom, a first edge and a second edge, the rolled member extending along the top in contact with the first end to the bottom in contact with the second end, the rolled member and extending in a non-helical spiral coil pattern from the first edge at the hollow tube to a second edge at the side wall;
- and
- an outlet port open to the interior of the body, an entirety of the outlet port disposed through the first end and adjacent the side wall.
Dependencies are inferred from the claim text.